Results 51 to 60 of about 721 (167)

Annealing effect on grain boundary width of polycrystalline silicon for photovoltaic application

open access: yesRevue des Énergies Renouvelables, 2018
Nowadays, LPCVD (Low Pressure Chemical Vapor Deposition) and highly doped polycrystalline silicon films have numerous applications in microelectronic component manufacturing technologies, integrated circuits and solar cells.
B. Zaidi   +4 more
doaj  

Characterization of Phosphoric Acid Doped N-type Silicon Thin Films Printed on ITO Coated PET Substrate

open access: yesInternational Journal of Electrochemical Science, 2013
In this paper n-type polycrystalline silicon thin films deposited on ITO coated polyethylene terephthalate (PET) substrate by screen printing technique have been studied.
M.K.M. Ali   +3 more
doaj   +1 more source

In Situ Two‐Dimensional Residual Stress Characterization of Thin Films

open access: yesAdvanced Materials Technologies, EarlyView.
An integrated in situ curvature metrology platform combining speckle‐based curvature optical metrology (SCOM) with multi‐beam optical sensors (MOS) enables spatially resolved two‐dimensional curvature mapping of thick sputtered coatings. The SCOM technique provides excellent agreement with MOS while providing an extended measurable curvature range ...
Wai Jue Tan   +6 more
wiley   +1 more source

Thermal behavior of parasitic resistances of polycrystalline silicon solar cells

open access: yesRevue des Énergies Renouvelables, 2013
In this work, we investigate the influence of temperature on the series and shunt resistances of polycrystalline silicon solar cells and then to determine the specific expressions of both parasitic resistances as function of temperature.
S. Bensalem, M. Chegaar
doaj  

TFT Backplanes Doped by BF2 Ion for Improved Stability and AMOLED Display Quality

open access: yesAdvanced Electronic Materials
This study investigates the effects of various ion implantation processes on the electrical performance of flexible low‐temperature polycrystalline silicon (LTPS) thin‐film transistor (TFT) backplanes.
Ying Shen   +8 more
doaj   +1 more source

Amorphous IGZO, Crystalline IGO, Amorphous IGZO Triple Active Layer With 2D Electron Gas at Both Interfaces for High Performance TFTs

open access: yesAdvanced Materials Technologies, EarlyView.
The dual‐gate coplanar a‐IGZO/C‐IGO/a‐IGZO TFT is investigated, exhibiting a high filed‐effect mobility of 53.81 cm2 V−1s−1 with excellent stability. The amorphous IGZO layer provides smooth surface, which carrier scattering and high‐quality interface between gate insulator and active layer.
Solbee Lee   +4 more
wiley   +1 more source

Two‐Step Thermal Upcycling of Flexible Printed Circuit Board Waste Into Metallic Copper Nanoparticles: Synthesis and Characterization

open access: yesAdvanced Materials Technologies, EarlyView.
A two‐step thermal upcycling process converts flexible printed circuit board waste into high‐purity copper nanoparticles using polymer degradation and arc discharge. The synthesized nanoparticles exhibit controlled morphology and high metal purity.
Bikesh S. Ghinangju   +2 more
wiley   +1 more source

TECHNOLOGIES FOR HETEROSTRUCTURES FORMATION OF TRANSDUCER

open access: yesИзвестия высших учебных заведений. Поволжский регион:Технические науки, 2020
Background. The relevance of the work is due to the high heterogeneity of the elements and structures of modern microelectronic converters of physical quantities, designed to operate in a wide range of temperatures and radiation.
P. G. Mikhaylov   +2 more
doaj   +1 more source

Extrinsic Limitations of Stealthy Hyperuniform Devices

open access: yesAdvanced Optical Materials, EarlyView.
Stealthy hyperuniform devices exhibit a scattering‐free angular region whose extent follows a simple quenching equation. Experimental measurements confirm this prediction but reveal quenching efficiencies far below theoretical expectations. Multiple scattering and finite‐size effects are quantified, establishing realistic performance limits for ...
Yuhao Xu   +5 more
wiley   +1 more source

Controlling Polystyrene Particle Distribution in Colloidal Lithography For Correlated‐Disorder Structures

open access: yesAdvanced Optical Materials, EarlyView.
Colloidal lithography is a low‐cost, simple and scalable technique to fabricate correlated‐disorder nanostructures for light‐trapping in solar cells. This work investigates the control of polystyrene particle distribution in colloidal lithography, highlighting the importance of particle surface functionalization as well as the ability to tune the ...
Laura de Almeida   +5 more
wiley   +1 more source

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