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Amplitude Versus Angle (AVA) feature restoration in prestack gathers via dictionary learning. [PDF]
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N/A, 2014
This book introduces the concept of novel process windows, focusing on cost improvements, safety, energy and eco-efficiency throughout each step of the process. The first part presents the new reactor and process-related technologies, introducing the potential and benefit analysis.
Hessel, V., Kralisch, D., Kockmann, N.
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This book introduces the concept of novel process windows, focusing on cost improvements, safety, energy and eco-efficiency throughout each step of the process. The first part presents the new reactor and process-related technologies, introducing the potential and benefit analysis.
Hessel, V., Kralisch, D., Kockmann, N.
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Process Window for Plasma Spray Processes
International Thermal Spray Conference, 2001Abstract A method for creation of a process window for on-line monitoring and controlling of the particle velocity and temperature during plasma spraying in order to enable desired coating microstructure is presented. The desired coating is specified by determination of the ranges within which the different microstructure features and ...
M. Friis, C. Persson
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Window Query Processing in Linear Quadtrees
Distributed and Parallel Databases, 2001zbMATH Open Web Interface contents unavailable due to conflicting licenses.
Aboulnaga, Ashraf, Aref, Walid G.
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WFApprox: Approximate Window Functions Processing
2020Window functions, despite being supported by all major database systems, are unable to keep up with the steeply growing size of data. Recently, some approximate query process (AQP) systems are proposed to deal with large and complex data in relational databases, which offer us a flexible trade-off between accuracy and efficiency.
Chunbo Lin +4 more
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Rules based process window OPC
SPIE Proceedings, 2008As a preliminary step towards Model-Based Process Window OPC we have analyzed the impact of correcting post-OPC layouts using rules based methods. Image processing on the Brion Tachyon was used to identify sites where the OPC model/recipe failed to generate an acceptable solution.
Sean O'Brien +3 more
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ACM SIGDA Newsletter, 2010
Process window is a collection of values of process parameters that allow circuit to be manufactured and to operate under desired specifications. For instance, lithographic process window is typically defined as the set of {focus, exposure} points to control critical dimension (CD) variation to within 10%. One simple way visualizing it is using a Focus-
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Process window is a collection of values of process parameters that allow circuit to be manufactured and to operate under desired specifications. For instance, lithographic process window is typically defined as the set of {focus, exposure} points to control critical dimension (CD) variation to within 10%. One simple way visualizing it is using a Focus-
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2009
Data Streams are infinite in nature. As a result, a query that executes over data streams specifies a ‘‘window’’ of focus or the part of the data stream that is of interest to the query. When new data items arrive into the data stream, the window may either expand or slide to allow the query to process these new data items.
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Data Streams are infinite in nature. As a result, a query that executes over data streams specifies a ‘‘window’’ of focus or the part of the data stream that is of interest to the query. When new data items arrive into the data stream, the window may either expand or slide to allow the query to process these new data items.
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Improved process window modeling techniques
SPIE Proceedings, 2010The continuous reduction of device dimensions and densities of integrated circuits increases the demand for accurate process window models used in optical proximity correction. Beamfocus and dose are process parameters that have significant contribution to the overall critical feature dimension error budget.
Christian Zuniga, Tamer Tawfik
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Optical Window Addressable Memory Processing
Topical Meeting on Optical Computing, 1985An electro-optic approach to the selection of the closest match between an object described by a feature vector and a set of known feature vectors is described. The problem is formulated as parallel vector-matrix multipliers and a summing operation of the form: Typical problems usually do not call for an exceptionally rapid update of the stored ...
D. J. Condon +3 more
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