Results 251 to 260 of about 2,207,660 (295)

Establishment of Stamping Process Windows

SAE Technical Paper Series, 1999
<div class="htmlview paragraph">A stamping process window is a set of ranges of the critical input variables in the process. Quality parts can be produced only if all of these variables fall within their respective ranges. To achieve this, the window has to be wide enough and the process properly located within the window.
Z T Zhang, D G Monette, R J Monroe, B L Dailey   +3 more
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Systems Engineering Process Help Window

INCOSE International Symposium, 1997
ABSTRACTTraining accomplished closest to the need best serves that need. Most systems engineering training opportunities, where they do occur, are too far removed in time from the need for that training. Commonly, good external training opportunities cost more than we can afford to spend and are not scheduled for our convenience but rather for broader ...
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Process Window Centering for 22 nm Lithography

IEEE Transactions on Semiconductor Manufacturing, 2010
PWC (Process Window Centering) is an efficient methodology to validate or adjust and center the overall process window for a particular lithography layer by detecting systematic and random defects. The PWC methodology incorporates a defect inspection and analysis of the entire die that can be automated to provide timely results.
Ralf Buengener, Carol Boye, Bryan N. Rhoads, Sang Y. Chong, Charu Tejwani, Sean D. Burns, Andrew D. Stamper, Kourosh Nafisi, Colin J. Brodsky, Susan S. Fan, Sumanth Kini, Roland Hahn   +11 more
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“Window” Shopping Online: Cognitive Processing of General and Specific Product Windows

Journal of Interactive Advertising, 2013
In this study, 36 participants navigated Amazon.com while their on-screen activity and physiological responses were recorded. An analysis of on-screen activity showed online shopping as a series of transitions between general browsing array pages (e.g., computers) and specific product pages (e.g., Apple MacBook).
Wise, Kevin, Alhabash, Saleem, Eckler, Petya   +2 more
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Mathieu Windows for Signal Processing

Circuits, Systems, and Signal Processing, 2018
Two new windows for signal processing are introduced in this work. The windows are based on radial Mathieu functions and their performance is compared with well-known ones such as Kaiser, cosh, exponential, Hamming, prolate, and other windows. Most of the results are focused on 1D systems (or windows) and extensions to 2D and multidimensional cases are
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OPC to improve lithographic process window

SPIE Proceedings, 2006
Optical Proximity Correction (OPC) has become an indispensable tool used in deep sub-wavelength lithographic processes. OPC has been quite successful at reducing the linewidth dispersion across a product die, and also improving the overlapping process window of all printed features.
James Word, Kyohei Sakajiri
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Turnkey Processes for Window Encapsulation

SAE Technical Paper Series, 1990
<div class="htmlview paragraph">As window encapsulation technology advances, the requirement for process improvements to decrease cycle time, improve part quantity, and to minimize labor requirements becomes very important to the manufacturers.
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Processing Sliding Windows over Disordered Streams

2008 International Conference on Information Networking, 2008
Bursty and out-of-order tuple arrivals complicate the process of determining the content and boundary of sliding windows. To process windows over such streams, two issues need to be addressed: how to sort input tuples efficiently and how to estimate punctuations.
Hyeon Gyu Kim, Myoung Ho Kim
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Novel Process Windows – Gate to Maximizing Process Intensification via Flow Chemistry

Chemical Engineering & Technology, 2009
AbstractDriven by the economics of scale, the size of reaction vessels as the major processing apparatus of the chemical industry has became bigger and bigger [1, 2]. Consequently, the efforts for ensuring mixing and heat transfer have also increased, as these are scale dependent.
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Process window control using CDU master

SPIE Proceedings, 2012
As double patterning techniques such as spacer double/quadruple patterning mature, ArF water immersion lithography is expected to be applied down to the 1x nm hp node or beyond. This will necessitate precise process control solutions to accommodate extremely small process windows.
Tomoharu Fujiwara, Tsuyoshi Toki, Daishi Tanaka, Maki Sato, Junichi Kosugi, Rika Tanaka, Naruo Sakasai, Toshio Ohashi, Ryoko Nakasone, Akira Tokui   +9 more
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