Results 1 to 10 of about 8,152,883 (248)

Tuning formation process of void defects in microcolumn arrays via pulse reverse electrodeposition

open access: yesJournal of Materials Research and Technology, 2023
The pulse reverse current electrodeposition process consists of two stages: the forward deposition and reverse dissolution. This study aims to understand the characteristics of forward deposition and reverse dissolution and to reveal their influences on ...
Yanzhuo Dong   +5 more
doaj   +4 more sources

Influence of pulse reverse current parameters on electrodeposition of copper-graphene nanocomposite coating

open access: yesApplied Surface Science Advances, 2021
This work focuses on the influence of pulse reverse current parameters such as duty cycle and frequency on the microstructure and properties of graphene reinforced copper nanocomposite (Cu-Gr) coating.
Antony Joseph   +5 more
doaj   +4 more sources

An Improved Optimization Model to Predict the Deposition Rate and Smoothness of Ni Pulse-Reverse Electroplating Based on ANN and Experimental Results

open access: yesMetals, 2022
The metallic layers are an essential part of MEMS (micro electromechanical system) devices, and their deposition process must be accurately controlled; this may lead to difficulties as there are many input parameters for such a process.
Reza Ahmadian Koochaksaraie   +2 more
doaj   +1 more source

Memristive Hodgkin-Huxley Spiking Neuron Model for Reproducing Neuron Behaviors

open access: yesFrontiers in Neuroscience, 2021
The Hodgkin-Huxley (HH) spiking neuron model reproduces the dynamic characteristics of the neuron by mimicking the action potential, ionic channels, and spiking behaviors. The memristor is a nonlinear device with variable resistance.
Xiaoyan Fang   +8 more
doaj   +1 more source

Energy characteristics for nanosecond current interrupter of semiconductor-magnetic pulse generator’s terminal stage

open access: yesElectrical engineering & Electromechanics, 2023
Introduction. A semiconductor diode based on reverse current interruption is used to increase a pulse amplitude and peak power delivered on the process load.
O. I. Khrysto
doaj   +1 more source

Suppression of cathode tool wear by a forward-bias voltage in pulsed spark-assisted chemical engraving

open access: yesElectrochemistry Communications, 2020
Pulsed spark-assisted chemical engraving (SACE) is a promising technology for micromachining of insulating materials, with no burrs, no cracks and no residues left after processing. Cathode tool wear, however, is one of the problems that must be overcome
Shunda Zhan, Yonghua Zhao
doaj   +1 more source

Electrodeposition and analysis of thick bismuth films

open access: yesScientific Reports, 2023
Due to its unique physical and chemical properties, bismuth is an attractive candidate for a wide range of applications such as battery anodes, radiation shielding, and semiconductors, to name a few.
Kendrich O. Hatfield   +7 more
doaj   +1 more source

Effect of Pulse Reverse electrodeposition Parameters on the Microstructure of the Ni/NiO Composite Coating

open access: yesInternational Journal of Electrochemical Science, 2020
In this paper, a Ni/NiO composite coating has been prepared by the pulse reverse current (PRC) plating technique and the effects of parameters including average current density, pulse frequency, total duty cycle, forward duty cycle, plating temperatures ...
Ping Wang   +4 more
doaj   +1 more source

Improving parameters of planar pulse diode using gettering

open access: yesTekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2021
Pulse diodes are widely used as part of high-frequency pulse circuits. However, it should be noted that the cost of pulsed diodes remains relatively high, due to the low yield of suitable devices when they are sorted according to the criteria of reverse ...
Viktor Litvinenko   +3 more
doaj   +1 more source

Influence of Voltage, Pulselength and Presence of a Reverse Polarized Pulse on an Argon–Gold Plasma during a High-Power Impulse Magnetron Sputtering Process

open access: yesPlasma, 2023
This work aims to provide information about the deposition of gold via bipolar high-power impulse magnetron sputtering (HIPIMS) in order to identify suitable process parameters.
Jürgen Guljakow, Walter Lang
doaj   +1 more source

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