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Pulsed Laser Deposition: An Overview

1999
We present the historical background and the main development trends of a very rapidly growing research field: pulsed laser deposition for obtaining high-quality thin films for use in science and technology. We emphasize the main physical phenomena involved, such as the role of the plasma in the deposition process, the relation between the irradiation ...
I. N. Mihailescu, E. György
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Pulsed-Laser Deposition

1994
Abstract This article presents a general description of pulsed-laser deposition. It describes the components of pulsed-laser deposition equipment. The article also discusses the effects of angular distribution of materials. Finally, the article reviews the characteristics of high-temperature superconductors and ferroelectric materials.
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Pulsed-laser deposition of polytetrafluoroethylene

Journal of Materials Research, 1995
Thin films of polytetrafluoroethylene have been deposited on amorphous substrates by the pulsed-laser deposition technique. By transmission electron microscopy, the polymer films were shown to consist of both amorphous and crystalline components. The data for the crystalline component are consistent with it being highly ordered with the long helical ...
Wenbiao Jiang   +3 more
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Pulsed-laser deposition of selenium

Journal of Materials Science, 1995
The preparation and characterization of amorphous selenium thin films grown by pulsed-laser deposition (PLD) is presented. Two laser excitation regimes at 1064 and 532 nm were studied. Interesting relations between the surface quality and the different experimental parameters were found. High-purity thin films were produced with surface quality similar
M. Fernández-Guasti   +4 more
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Nonequilibrium Interlayer Transport in Pulsed Laser Deposition

Physical Review Letters, 2006
We use time-resolved surface x-ray diffraction measurements with microsecond range resolution to study the growth kinetics of pulsed laser deposited . Time-dependent surface coverages corresponding to single laser shots were determined directly from crystal truncation rod intensity transients. Analysis of surface coverage evolution shows that extremely
J Z, Tischler   +5 more
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Pulsed laser deposition of nasicon thin films

Applied Surface Science, 1996
Abstract We have deposited NASICON (Na SuperIonicCONductor) films of thicknesses ranging from 100 to 600 nm, by Pulsed Laser Deposition (PLD), onSiO2Si substrates. The deposition rates varied from6 × 10−3 to 0.08 nm/pulse depending on the conditions employed. XPS measurements show that all elements are transferred from the target to the substrate and
R. Izquierdo   +7 more
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Process control and pulsed laser deposition of materials

Integrated Ferroelectrics, 2000
Abstract Pulsed-laser deposition (PLD) is a very powerful and rapid deposition technique, which can produce exceptional-quality thin films. Although PLD has tremendous versatility and potential, PLD capabilities are still constrained by a lack of process control. At the Air Force Research Laboratory on-site at Wright-Patterson AFB, we are developing in-
Biggers, R.   +8 more
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Pulsed Laser Deposition of Carbon Nanofoam

SSRN Electronic Journal, 2022
Maffini, A.   +4 more
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Pulsed Laser Deposition: A valuable tool for nanotechnology

2022
Trabajo presentado en el International workshop on Applications of Nanotechnology to Energy, Environment and Biotechnology, celebrado en India, en diciembre de ...
Gonzalo de los Reyes, J.   +4 more
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Femtosecond pulsed laser deposition [PDF]

open access: possible, 2009
This thesis investigates two variations of the conventional pulsed laser deposition (PLD) technique. The first technique is femtosecond PLD, whereby the laser used to ablate the target has a significantly higher peak intensity and shorter pulse duration as compared to conventional nanosecond lasers more commonly used for PLD.
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