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Primary and secondary mechanisms in laser-pulse sputtering
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1992Abstract Primary sputtering mechanisms are conventionally grouped in terms of the categories collisional, thermal , and electronic . With pulsed photons one must. in addition, consider the emission of droplets and fragments in thermomechanical processes.
R. Kelly +4 more
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Applications of Surface Science, 2019
The coatings of tungsten borides (WBx) and tungsten borides doped with titanium (WyTi1−yBx) were deposited by using combined magnetron sputtering - pulsed laser deposition technique.
J. Chrzanowska-Giżyńska +7 more
semanticscholar +1 more source
The coatings of tungsten borides (WBx) and tungsten borides doped with titanium (WyTi1−yBx) were deposited by using combined magnetron sputtering - pulsed laser deposition technique.
J. Chrzanowska-Giżyńska +7 more
semanticscholar +1 more source
Pulse Laser Removal of Sputtered Oxide Films: Measurement of Adhesion Strength
CLEO/Europe Conference on Lasers and Electro-Optics, 1998Heating power of continuous lasers (CO2) has been demonstrated to motivate the spall of coatings by generating compressive stress in the coating1. On the other hand, dynamic spallation of coatings can be checked by using pulsed lasers, as shown in the pionnering work presented by Vossen2.
R. Oltra, C. Sartori, J.P. Boquillon
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Laser-pulse sputtering of aluminum: Vaporization, boiling, superheating, and gas-dynamic effects
Physical Review E, 1994We have developed a numerical method to describe laser-pulse sputtering of Al in a thermal regime. The irradiation consists of a single pulse of triangular form having a duration of 30 ns. The laser light is assumed to be absorbed according to a simple exponential mechanism.
A. Peterlongo +2 more
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Teflon sputtering under pulsed CO/sub 2/-laser irradiation
2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666), 2005Teflon plate is irradiated by pulsed CO/sub 2/ laser. A crater with even edges without traces of melt or blackening was formed after irradiation of the teflon plate surface by focussed pulsed radiation of CO/sub 2/-laser with p.r.r. of /spl sim/1 Hz. Increasing of PTFE surface temperature resulted in increase of efficiency of teflon mass removed from ...
A.V. Fedenev +4 more
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Pulsed KrF laser annealing of RF sputtered ZnS:Mn thin films
Applied Surface Science, 1999Abstract Pulsed KrF laser annealing (PLA) of ZnS:Mn thin (800 nm) film phosphors has been investigated as an alternative to thermal annealing for the fabrication of electroluminescent devices. The influence of the surrounding gas pressure during exposure, the energy density (Ed) of the laser beam and the effect of double irradiation is reported ...
E.A. Mastio +4 more
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Magnetron Sputtered Pulsed Laser Deposition Scale Up
2003Abstract : The objective was primarily to utilize the newly developed Air Force super-hard coating process technologies in practical applications, such as turbine engine rotor components, precision shafts and ball bearings, and bearing races. This would give the Air Force the capability of practically coating real precision mechanical parts with solid ...
Jeffery J. Heyob, Samuel J. Laube
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TiC coatings prepared by pulsed laser deposition and magnetron sputtering
Surface and Coatings Technology, 1997Abstract Tribological properties of TiC coatings grown by pulsed laser deposition (PLD) and magnetron sputtering were investigated. The PLD TiC coatings grown at room temperature were found to be much harder than the TiC coatings grown by magnetron sputtering under the given experimental conditions.
Jinke Tang +2 more
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On the gas dynamics of laser-pulse sputtering of polymethylmethacrylate
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1991Abstract The laser-pulse sputtering of polymers should have two limiting cases. In the one there is ongoing release of particles from the target surface, the particles then form a Knudsen layer (KL), and there is finally an unsteady adiabatic expansion (UAE) (‘effusion’ model).
Bodil Braren +2 more
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Magnetron sputter pulsed laser deposition: technique and process control developments
Surface and Coatings Technology, 2004Abstract This paper investigates the use of process control in the deposition of nanocomposite thin-films by the magnetron-sputtering/pulsed laser deposition (MSPLD) method. A series of YSZ/Au films was deposited with closed loop feedback control, based on plume emissions, used to update both the laser and magnetron power settings simultaneously to ...
J.G. Jones, A.A. Voevodin
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