Results 161 to 170 of about 219,973 (335)

Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiNx for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles

Advanced Materials Interfaces, EarlyView.
Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim, Sung Kyu Jang, Jihun Kim, Jong‐Hyun Choi, Ji‐Beom Yoo, Hyun‐Mi Kim, Seul‐Gi Kim, Hyeongkeun Kim   +7 more
wiley   +1 more source

Wet Ageing of Chilled Young-Giraffe (<i>Giraffa camelopardalis angolensis</i>) Meat as Influenced by Sex and Muscle. [PDF]

Foods
Silberbauer BL, Kokošková T, Bureš D, Kotrba R, Strydom PE, Kidd M, Hoffman LC.   +6 more
europepmc   +1 more source

Radiotherapy Enhancement by Gold Nanocluster‐functionalized Nanoliposomes Using Polychromatic Orthovoltage X‐ray Irradiation

Advanced Materials Interfaces, EarlyView.
Lipid drug carriers to which ultra‐small gold nanoparticles were added enabled more efficient radiotherapy of cultured pancreatic cancer tumors. These nanoparticles boosted radiation‐induced damage to tumors by generating more reactive molecules, though higher gold levels are needed for strong benefits.
Nazareth Milagros Carigga Gutierrez, Eaazhisai Kandiah, Sofia Leo, Erwan Dupont, Fabrizio Johnson‐Corrales, Marc‐André Hograindleur, Sarvenaz Keshmiri, Hélène Elleaume, Benoit Busser, Romain Haudecoeur, Véronique Jacob, Anthony Vella, Véronique Josserand, Maxime Henry, Jean‐Luc Coll, Amandine Hurbin, Xavier Le Guével, Mans Broekgaarden   +17 more
wiley   +1 more source

A Purge-and-Trap Gas Chromatography-Mass Spectrometry Method for the Quantitative Determination of Six Haloacetonitriles in Drinking Water. [PDF]

Toxics
Wang Y, Liu Y, Li J, Huang X, Li J, Liang X.   +5 more
europepmc   +1 more source

Enhancing Stability of Few‐Layer Black Phosphorus (FLBP) Through Nitrocellulose Coating: A Robust Defense Mechanism Against Degradation

Advanced Materials Interfaces, EarlyView.
In this research, a simple and scalable strategy for protection of a few‐layer black phosphorus (FLBP) with a cellulose nitrate‐based material is presented. The FLBP is structurally and morphologically characterized. The FLBP stability with and without nitrocellulose protection is monitored by interferometric method, surface profile examination, and ...
Paweł Jakóbczyk, Michał Suplewski, Jacek Łubiński, Jakub Gierowski, Monika Kosowska, Mirosław Sawczak, Mattia Pierpaoli, Filip Janiak, Małgorzata Szczerska   +8 more
wiley   +1 more source

The association between childhood traumatic events and weight restoration in adult anorexia nervosa inpatient treatment: a longitudinal study. [PDF]

Eat Weight Disord
Meyer-Schwickerath L, Suling A, Löwe B, Kottich S, Weigel A.   +4 more
europepmc   +1 more source

LFA: A Lattice Fourier Analyzer for Quantitative In Situ EC‐STM of Adsorbate–Substrate Superstructures

Advanced Materials Interfaces, EarlyView.
Although electrochemical scanning tunneling microscopy provides atomic‐scale access to electrified interfaces, quantitative in situ and operando investigations suffer from drift‐induced distortions. This work introduces the Lattice Fourier Analyzer (LFA), which employs substrate‐anchored affine drift correction in reciprocal space to recover precise ...
Rafał Lewandków, Paulina Wira, Anna Futyma, Radosław Wasielewski, Tomasz Kosmala   +4 more
wiley   +1 more source

Establishment of a Purge and Trap Continuous-Flow Isotope Ratio Mass Spectrometer System for Analysis of Stable Nitrate Isotopes (δ¹⁵N and δ¹⁸O) in Water Samples by Ti(III) Reduction. [PDF]

Rapid Commun Mass Spectrom
Gcakasi MN, Stumpp C, Watzinger A.
europepmc   +1 more source

Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High‐k Rutile Capacitors

Advanced Materials Interfaces, EarlyView.
The first direct atomic layer deposition (ALD) process of molybdenum dioxide (MoO2) thin films is reported using molybdenum(II) acetate dimer (Mo2(OAc)4) and oxygen (O2) as precursors at 235°C–275°C. The films are crystalline, exceptionally pure, and conductive.
Alexey Ganzhinov, Miika Mattinen, Marko Vehkamäki, Kenichiro Mizohata, Mykhailo Chundak, Georgi Popov, Paavo Porri, Mikko Ritala, Matti Putkonen   +8 more
wiley   +1 more source

Let\u27s Purge the Augean Stables [PDF]

, 2015
Wagner, Karen
core   +1 more source