Results 11 to 20 of about 806 (172)
Reducing complexity in photonic simulations: ZenScat — an efficient 2D RCWA solver
SoftwareXWe present a comprehensive solver implementation of a 2D Rigorous Coupled Wave Analysis (RCWA), tailored specifically for conformal thin multilayer devices and 2D photonic crystals with arbitrary interface profiles.
I. Lukosiunas +2 more
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Fourier ellipsometry – an ellipsometric approach to Fourier scatterometry [PDF]
Journal of the European Optical Society-Rapid Publications, 2015 An extension of Fourier scatterometry is presented, aiming at increasing the sensitivity by measuring the phase difference between the reflections polarized parallel and perpendicular to the plane of incidence.
Petrik P. +7 more
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Phase retrieval between overlapping orders in coherent Fourier scatterometry using scanning [PDF]
Journal of the European Optical Society-Rapid Publications, 2013 Non-interferometric phase retrieval from the intensity measurements in Coherent Fourier Scatterometry (CFS) is presented using a scanning focused spot.
Kumar N. +4 more
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Nanomaterials, 2022 Mueller matrix ellipsometry (MME) is a powerful metrology tool for nanomanufacturing. The application of MME necessitates electromagnetic computations for inverse problems of metrology determination in both the conventional optimization process and the ...
Hoang-Lam Pham +4 more
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Two‐dimensional synthetic aperture imaging of targets behind reinforced concrete walls
IET Radar, Sonar & Navigation, 2022 Synthetic aperture imaging of targets closely behind a reinforced concrete wall, modelled by a periodic structure by using the proper Green's function (GF) of the structure, is studied.
Alireza Ghobadi‐Rad +2 more
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IEEE Access, 2020 Based on the first-order Taylor expansion, an efficient Rigorous Coupled-Wave Analysis (RCWA) for one-dimensional ultrathin periodic structures is proposed in this paper.
Jie Li +8 more
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Applied Sciences, 2023 Diffraction gratings are becoming a preferred option for waveguide head-mounted in–out coupling devices due to their flexible optical properties and small size and light weight.
Mianhui Weng +3 more
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A Photolithography Process Design for 5 nm Logic Process Flow
Journal of Microelectronic Manufacturing, 2019 With the introduction of EUV lithography, the photolithographic process in 5 nm logic process can be simplified to use mostly single exposure method. In a typical 5 nm logic process, the contact-poly pitch (CPP) is 44-50 nm, the minimum metal pitch (MPP)
Qiang Wu +3 more
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A 1 × 2 Two-Dimensional Slanted Grating Based on Double-Layer Cylindrical Structure
Applied Sciences, 2023 Diffraction gratings play an increasingly important role in various planar optical systems, such as near-eye display systems for virtual reality (VR) and augmented reality (AR). The slanted gratings have more advantages than other elements.
Yuda Chen +5 more
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Numerical Modeling of Sub-Wavelength Anti-Reflective Structures for Solar Module Applications
Nanomaterials, 2014 This paper reviews the current progress in mathematical modeling of anti-reflective subwavelength structures. Methods covered include effective medium theory (EMT), finite-difference time-domain (FDTD), transfer matrix method (TMM), the Fourier modal ...
Katherine Han, Chih-Hung Chang
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