Results 101 to 110 of about 72,916 (314)

Single crystal diamond micro-disk resonators by focused ion beam milling

APL Photonics, 2018
We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm × 3 mm × 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling.
Teodoro Graziosi, Sichen Mi, Marcell Kiss, Niels Quack   +3 more
doaj   +1 more source

Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films

Applied Sciences, 2019
Nanoplasmonic waveguides utilizing surface plasmon polaritons (SPPs) propagation have been investigated for more than 15 years and are now well understood.
Alina A. Dobronosova, Anton I. Ignatov, Olga S. Sorokina, Nikolay A. Orlikovskiy, Michail Andronik, Aleksey R. Matanin, Kirill O. Buzaverov, Daria A. Ezenkova, Sergey A. Avdeev, Dimitry A. Baklykov, Vitaly V. Ryzhkov, Aleksander M. Merzlikin, Aleksander V. Baryshev, Ilya A. Ryzhikov, Ilya A. Rodionov   +14 more
doaj   +1 more source

A dicing free SOI process for MEMS devices

, 2012
This paper presents a full wafer, dicing free, dry release process for MEMS silicon-on-insulator (SOI) sensors and actuators. The developed process is particularly useful for inertial sensors that benefit from a large proof mass, for example ...
Abdolvand, Bertz, Boser, Burbaum, Chae, Dong, Hsu, Hsu, Ibrahim Sari, Ioannis Zeimpekis, Kunz, Li, Marty, Matsumoto, Matsumoto, Michael Kraft, Overstolz, Raccurt, Renard, Rodjegard, Rudolf, Selvakumar, Su, Tsuchiya, Williams, Zimmermann   +25 more
core   +1 more source

Device Integration Technology for Practical Flexible Electronics Systems

Advanced Functional Materials, EarlyView.
Flexible device integration technologies are essential for realizing practical flexible electronic systems. In this review paper, wiring and bonding techniques critical for the industrial‐scale manufacturing of wearable devices are emphasized based on flexible electronics.
Masahito Takakuwa, Kento Yamagishi, Sunghoon Lee, Yusaku Tagawa, Takao Someya, Tomoyuki Yokota   +5 more
wiley   +1 more source

Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon

Proceedings, 2017
This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be ...
Marta Kluba, Aslihan Arslan, Ronald Stoute, James Muganda, Ronald Dekker   +4 more
doaj   +1 more source

Wafer‐Scale Integration of α‐quartz Thin Films toward Super High Frequency Piezoelectric bioNEMS for Chikungunya Virus Detection

Advanced Functional Materials, EarlyView.
Epitaxial piezoelectric α‐quartz/Si BioNEMS sensors, made using soft chemistry, effectively detect the Chikungunya virus. They have a mass sensitivity of 205 pg Hz−1 in liquid and can detect the virus at a limit of 9 ng mL−1. This development enables high‐frequency mass devices for point‐of‐care testing in healthcare and other electronic applications ...
Raissa Rathar, Sijie Ding, David Sanchez‐Fuentes, Claire Jolly, Charlotte André‐Arpin, Rudy Desgarceaux, Nicolas Guillaume, Gustavo Ardila, Ricardo Garcia‐Bermejo, Jaume Gazquez, Sergi Plana‐Ruiz, Laura Picas, Adrian Carretero‐Genevrier   +12 more
wiley   +1 more source

Etching technique of high aspect ratio silicon trenches based on CMOS-MEMS process

Dianzi Jishu Yingyong, 2018
Etching technique of deep silicon trenches with high aspect ratio is critical in improving integration and accuracy of Micro-Electro-Mechanical Systems(MEMS)sensor array and reducing the cost of it.
Zhang Haihua, Lv Yufei, Lu Zhongxuan
doaj   +1 more source

Unraveling the Mechanism of Maskless Nanopatterning of Black Silicon by CF₄/H₂ Plasma Reactive-Ion Etching. [PDF]

ACS Omega, 2022
Ghezzi F, Pedroni M, Kovač J, Causa F, Cremona A, Anderle M, Caniello R, Pietralunga SM, Vassallo E.   +8 more
europepmc   +1 more source

Fabrication of Polymeric Multimode Waveguides for Application in the Local Area Network and Optical Interconnects. [PDF]

, 2000
We report the fabrication of multimode polymeric waveguides using spin coating, photolithography, and reactive ion etching. Different layer structures have been used, e.g., a UV curable resin is used as a core layer and PMMA as a lower and upper cladding.
Driessen, A., Lagali, N., Musa, S., Sengo, G., Sulur,   +4 more
core   +1 more source

Peak‐in‐Valley Metal Nano‐Architectures via E‐Beam‐Guided Metal Oxide Redox

Advanced Functional Materials, EarlyView.
Focused electron beam irradiation of nanoelectrosprayed water‐ammonia films enables the synthesis of topologically complex metal nanostructures via solvent‐mediated metal/metal‐ion redox control. Low ammonia favors radiolytic oxidation, etching copper.
Auwais Ahmed, Andrei G. Fedorov
wiley   +1 more source