Results 101 to 110 of about 73,664 (313)
Plasma Nanoscience: from Nano-Solids in Plasmas to Nano-Plasmas in Solids
The unique plasma-specific features and physical phenomena in the organization of nanoscale solid-state systems in a broad range of elemental composition, structure, and dimensionality are critically reviewed.
Meyyappan, M. +2 more
core +2 more sources
Multifunctional Microstructured Surfaces by Microcontact Printing of Reactive Microgels
Reactive poly(N‐vinylcaprolactam‐co‐glycidyl methacrylate) microgels are used as functional inks to create surface‐grafted arrays on glass via microcontact printing. The patterns (10–50 µm widths and spacings) enable stable binding and post‐functionalization with dyes and peptides.
Inga Litzen +4 more
wiley +1 more source
Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films
Nanoplasmonic waveguides utilizing surface plasmon polaritons (SPPs) propagation have been investigated for more than 15 years and are now well understood.
Alina A. Dobronosova +14 more
doaj +1 more source
Plasma Parameters and Kinetics of Reactive Ion Etching of SiO2 and Si3N4 in an HBr/Cl2/Ar Mixture
Alexander Efremov +2 more
openalex +2 more sources
Thermoelectric temperature sensors are developed that directly measure heat changes during optical‐based neural stimulation with millisecond precision. The sensors reveal the temperature windows for safe reversible neural modulation: 1.4–4.5 °C enables reversible neural inhibition, while temperatures above 6.1 °C cause permanent thermal damage.
Junhee Lee +9 more
wiley +1 more source
Single crystal diamond micro-disk resonators by focused ion beam milling
We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm × 3 mm × 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling.
Teodoro Graziosi +3 more
doaj +1 more source
Fabricating Ultra-Thin Silicon Carbide Diaphragms [PDF]
A process for fabricating relatively thin SiC diaphragms may include fast Reactive Ion Etching (RIE) followed by Dopant Selective Reactive Ion Etching (DSRIE). The process may produce silicon carbide (SiC) diaphragms thinner than 10 microns.
Okojie, Robert S.
core +1 more source
Two‐photon lithography (TPL) enables 3D magnetic nanostructures with unmatched freedom in geometry and material choice. Advances in voxel control, deposition, and functionalization open pathways to artificial spin ices, racetracks, microrobots, and a number of additional technological applications.
Joseph Askey +5 more
wiley +1 more source
In this research, it is demonstrated that dual nitrogen and sulfur doping in hollow carbon spheres creates a tunable coordination environment that stabilizes cationic Pd single atoms as robust organometallic complexes, enabling high selectivity and stability for electrochemical hydrogen peroxide production under harsh acidic and peroxide‐rich ...
Guilherme V. Fortunato +16 more
wiley +1 more source
Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon
This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be ...
Marta Kluba +4 more
doaj +1 more source

