Results 111 to 120 of about 156,728 (358)
RF reactor with asymmetrical electrodes for reactive ion etching of semiconductors [PDF]
Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2011 Results of experimental and theoretical study of RF CCP reactor for reactive ion etching of semiconductors are presented. Breakdown curve and domain of the discharge existence are measured in various gases (argon, fluorocarbon, oxygen).
Dudin S. V. +3 more
doaj
Fabricating Ultra-Thin Silicon Carbide Diaphragms [PDF]
A process for fabricating relatively thin SiC diaphragms may include fast Reactive Ion Etching (RIE) followed by Dopant Selective Reactive Ion Etching (DSRIE). The process may produce silicon carbide (SiC) diaphragms thinner than 10 microns.
Okojie, Robert S.
core +1 more source
, 2011 Generation of powerful THz radiation from intrinsic Josephson Junctions (IJJs) of Bi2Sr2CaCu2O8+δ (Bi2212) may require mesas with large lateral dimensions. However, there are difficulties in fabrication of perfect rectangular mesas. The lateral angles of
H. Koseoglu +3 more
semanticscholar +1 more source
Advanced Functional Materials, EarlyView.Symmetry‐broken plasmonic nanoantenna arrays achieve broadband multiresonant enhancement of second harmonic generation (SHG), third harmonic generation (THG), and upconversion photoluminescence (UCPL), under femtosecond laser excitation across the near‐infrared range (1000–1600 nm).
Elieser Mejia +9 more
wiley +1 more source
Single crystal diamond micro-disk resonators by focused ion beam milling
APL Photonics, 2018 We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm × 3 mm × 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling.
Teodoro Graziosi +3 more
doaj +1 more source
Etching technique of high aspect ratio silicon trenches based on CMOS-MEMS process
Dianzi Jishu Yingyong, 2018 Etching technique of deep silicon trenches with high aspect ratio is critical in improving integration and accuracy of Micro-Electro-Mechanical Systems(MEMS)sensor array and reducing the cost of it.
Zhang Haihua, Lv Yufei, Lu Zhongxuan
doaj +1 more source
The research of reactive ion and plasma-chemical etching effect on a diamond coatings surface morphology [PDF]
, 2016 The effect of treatment by reactive ion etching in an argon atmosphere, and hydrogen plasma etching ina glow discharge plasma on the surface of the diamond films deposited by CVD method was investigated.
Гайдайчук, Александр Валерьевич +2 more
core
Fabrication of Diamond Nanowires for Quantum Information Processing Applications
, 2010 We present a design and a top-down fabrication method for realizing diamond nanowires in both bulk single crystal and polycrystalline diamond. Numerical modeling was used to study coupling between a Nitrogen Vacancy (NV) color center and optical modes of
Ando +35 more
core +1 more source
End-point determination of aluminum reactive ion etching by discharge impedance monitoring [PDF]
, 1979 Katsumi Ukai, Kunio Hanazawa
openalex +1 more source
Structured, Shaped, or Printed Single‐Atom Catalysts and Their Applications
Advanced Functional Materials, EarlyView.This paper reviews the design and use of structured single‐atom catalysts, which integrate porous architectures with the exceptional reactivity of isolated catalytic sites. It explores fabrication strategies, advanced characterization methods, and support materials that enhance thermal stability, mechanical robustness, and operational efficiency of ...
Jiachengjun Luo +4 more
wiley +1 more source