Results 101 to 110 of about 71,691 (287)
Dry etching of metallization [PDF]
The production dry etch processes are reviewed from the perspective of microelectronic fabrication applications. The major dry etch processes used in the fabrication of microelectronic devices can be divided into two categories - plasma processes in ...
Bollinger, D.
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Advanced Functional Materials, EarlyView.Gold bipyramids can act as efficient plasmonic nanoheaters, but they often reshape during laser heating. This study shows that oxygen nanobubbles drive oxidative etching and that surface ligands control stability. CTAB‐ and citrate‐coated particles blunt and lose optical performance, whereas polystyrene sulfonate preserves shape and heating by ...
Irene López‐Sicilia +7 more
wiley +1 more source
, 2018 Dielectric laser accelerators (DLAs) have proven to be good candidates for miniaturized particle accelerators. They rely on micro-fabricated dielectrics which are able to modulate the kinetic energy of the incoming electron beam under a proper laser ...
Boine-Frankenheim, Oliver +7 more
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Citation: 'reactive ion etching' in the IUPAC Compendium of Chemical Terminology, 5th ed.; International Union of Pure and Applied Chemistry; 2025. Online version 5.0.0, 2025. 10.1351/goldbook.09563 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual ...
openaire +1 more source
Advanced Functional Materials, EarlyView.Interphase chemistry governs the stability of multivalent metal batteries. We summarize state‐of‐the‐art developments in calcium and magnesium metal batteries by focusing on the correlation among electrolytes, interphase layers, and the electrochemical performance of corresponding metal anodes.
Huijun Lin +4 more
wiley +1 more source
Single crystal diamond micro-disk resonators by focused ion beam milling
APL Photonics, 2018 We report on single crystal diamond micro-disk resonators fabricated in bulk chemical vapor deposition diamond plates (3 mm × 3 mm × 0.15 mm) using a combination of deep reactive ion etching and Focused Ion Beam (FIB) milling.
Teodoro Graziosi +3 more
doaj +1 more source
Single-Step CMOS Compatible Fabrication of High Aspect Ratio Microchannels Embedded in Silicon
Proceedings, 2017 This paper presents a new method for the CMOS compatible fabrication of microchannels integrated into a silicon substrate. In a single-step DRIE process (Deep Reactive Ion Etching) a network of microchannels with High Aspect Ratio (HAR) up to 10, can be ...
Marta Kluba +4 more
doaj +1 more source
A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide. [PDF]
Materials (Basel), 2021 Racka-Szmidt K +4 more
europepmc +1 more source
Graphene etch mask for silicon [PDF]
, 2014 In this thesis, an alternative future use for graphene will be explored. Graphene, a popular two-dimensional material of remarkable electrical properties, has been thought to be a successor to current day microelectronic materials.
Rangarajan, Aniruddh
core
Sidewall depletion in nano-patterned LAO/STO heterostructures
, 2015 We report the fabrication of nanostructures from the quasi-two-dimensional electron gas (q2DEG) formed at the LaAlO$_{3}$/ SrTiO$_{3}$ (LAO/STO) interface. The process uses electron beam lithography in combination with reactive ion etching.
Blaschek, H. H. +3 more
core +2 more sources