Results 181 to 190 of about 73,664 (313)

Switchable Thermal Mid‐IR Conducting Polymer Antenna Arrays

Advanced Functional Materials, EarlyView.
This study presents switchable mid‐infrared plasmonic resonances in PEDOT antenna arrays. Their optical extinction peaks can be reversibly switched ‘OFF’ and ‘ON’ by tuning the polaronic charge carrier concentration via the polymer's redox state, offering modulation of optical responses in the thermal mid‐infrared range including around 10 µm ...
Pravallika Bandaru, Mohammad Shaad Ansari, Suraya Kazi, Dongqing Lin, Alexander Yu Polyakov, Magnus P. Jonsson   +5 more
wiley   +1 more source

Enhancing Si₃N₄ Selectivity over SiO₂ in Low-RF Power NF₃-O₂ Reactive Ion Etching: The Effect of NO Surface Reaction. [PDF]

Sensors (Basel)
Tung NH, Lee H, Dinh DK, Kim DW, Lee JY, Eom GW, Kim HU, Kang WS.   +7 more
europepmc   +1 more source

Reactive Ion Etching Selectivity of Si/SiO2: Comparing of two fluorocarbon gases CHF3 and CF4

, 2019
Meiyue Zhang, Pat G. Watson
openalex   +1 more source

Multipurpose Transparent Nanocomposites for Gamma Spectroscopy, Pulse Shape Discrimination, Thermal Neutron Detection, Radiation Shielding, and High Refractive Index Applications

Advanced Functional Materials, EarlyView.
Materials exist that are useful for gamma scintillation, radiation shielding, neutron‐gamma pulse shape discrimination (PSD), thermal neutron detection, or high refractive index applications. While certain materials have exhibited optimal performance for each of these applications, none achieve multiple functions.
Isabelle Winardi, Stephane Miaule, Robert Carmichael, Bowen Sun, Ziqing Han, Prabhav Surabhi, Zhen Luo, Noelan Hum, David Prout, Yi‐An Chen, Ting‐Hsuan Wu, Hao Yu, Arion Chatziioannou, Qibing Pei   +13 more
wiley   +1 more source

Microstructural characterization and inductively coupled plasma-reactive ion etching resistance of Y₂O₃-Y₄Al₂O₉ composite under CF₄/Ar/O₂ mixed gas conditions. [PDF]

Sci Rep
Ma HJ, Kim S, Kim HN, Kim MJ, Ko JW, Lee JW, Kim JH, Lee HC, Park YJ.   +8 more
europepmc   +1 more source

Enhanced Ion/Ioff Ratio and Controlled Threshold Voltage in Multi-Layer Mos2 Transistors Thinned by Reactive-Ion Etching Process

Dae-Young Jeon, Chang‐Woo Lee
openalex   +1 more source

Magnetism and Nonlinear Charge Transport in NiFe2O4/γ‐Al2O3/SrTiO3 Heterostructure: Toward Spintronic Applications

Advanced Functional Materials, EarlyView.
In this report, we demonstrate that a crystalline phase of 52nm thick NiFe2O4 can be grown by RF sputtering on top of γ‐Al2O3(8nm)/SrTiO3 at a significantly low temperature (150 °C) without compromising the mobility and carrier density of the 2D electron gas at the γ‐Al2O3(8nm)/SrTiO3 interface.
Amit Chanda, Thor Hvid‐Olsen, Christina Hoegfeldt, Anshu Gupta, Alessandro Palliotto, Fardin Ghaffari‐Tabrizi, Maja A. Dunstan, Kasper S. Pedersen, Dae‐Sung Park, Damon J. Carrad, Thomas Sand Jespersen, Felix Trier   +11 more
wiley   +1 more source

Fabrication of sharp silicon hollow microneedles by deep-reactive ion etching towards minimally invasive diagnostics. [PDF]

Microsyst Nanoeng, 2019
Li Y, Zhang H, Yang R, Laffitte Y, Schmill U, Hu W, Kaddoura M, Blondeel EJM, Cui B.   +8 more
europepmc   +1 more source

Design of Reactive Ion Etching Process Based on ab-initio Calculation-The First Step-

, 2007
Shigeno Matsumoto, Wilson Agerico Diño, Melanie David, Rifki Muhida, Tanglaw Roman, Shinichi Kunikata, Fumiyoshi Takano, Hiroyuki Akinaga, Hideaki Kasai   +8 more
openalex   +2 more sources

Intermediate Resistive State in Wafer‐Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications

Advanced Functional Materials, EarlyView.
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa, Milan Buttberg, Ke Ran, Rana Walied Ahmad, Dennis Braun, Lukas Völkel, Jimin Lee, Sofía Cruces, Bart Macco, Bárbara Canto, Holger Lerch, Thorsten Wahlbrink, Holger Kalisch, Michael Heuken, Andrei Vescan, Joachim Mayer, Zhenxing Wang, Ilia Valov, Stephan Menzel, Max C. Lemme   +19 more
wiley   +1 more source