Results 201 to 210 of about 106,837 (225)

Role of ions in reactive ion etching

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1994
Energetic ion bombardment is responsible for the anisotropic etching which can be obtained in reactive ion etching. This has been recognized for many years but the detailed mechanisms involved in this process are still not well understood. In this paper, the various phenomena resulting from ion bombardment of a surface in a reactive gas glow discharge ...
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Reactive Ion Etching of Aluminum/Silicon

Journal of The Electrochemical Society, 1983
High resolution, reproducible dry etching of Al/Si can be achieved using and mixtures in a hexagonal cathode reactive ion etching system. The etch directionality is a function of the composition, the number of wafers in the reactor, and the d‐c self‐bias voltage. Increases in the concentration of etching species produced by raising the percentage of in
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Morphologies and optical properties of black silicon by room temperature reactive ion etching

, 2020
F. Atteia, J. Le Rouzo, Lou Denaix, D. Duché, G. Berginc, J. Simon, L. Escoubas   +6 more
semanticscholar   +1 more source

Precise patterning of organic semiconductors by reactive ion etching

, 2020
M. Höppner, David Kneppe, H. Kleemann, K. Leo   +3 more
semanticscholar   +1 more source

Reactive Ion Etching (RIE)

2008
Sami Franssila, Lauri Sainiemi
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A Sliding-Mode Triboelectric Nanogenerator with Chemical Group Grated Structure by Shadow Mask Reactive Ion Etching.

ACS Nano, 2017
Wanyu Shang, Guangqin Gu, Feng Yang, Lei Zhao, G. Cheng, Z. Du, Zhong Lin Wang   +6 more
semanticscholar   +1 more source

Fabrication of Novel MEMS Microgrippers by Deep Reactive Ion Etching With Metal Hard Mask

Journal of microelectromechanical systems, 2017
A. Bagolini, S. Ronchin, P. Bellutti, Matteo Chistè, M. Verotti, N. Belfiore   +5 more
semanticscholar   +1 more source

Apparatus and method for reactive ion etching

2017
The invention relates to an apparatus for reactive ion etching of a substrate, comprising: a plasma etch zone including an etch gas supply and arranged with a plasma generating structure for igniting a plasma and comprising an electrode structure arranged to accelerate the etch plasma toward a substrate portion to have ions impinge on the surface of ...
Roozeboom, F., Lankhorst, A.M., Poodt, P.W.G., Koster, N.B., Winands, G.J.J., Vermeer, A.J.P.M.   +5 more
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Reactive ion etching in microcircuit fabrication

Thin Solid Films, 1981
G.C. Schwartz, P.M. Schaible
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Inductively coupled plasma reactive-ion etching of β-Ga2O3: Comprehensive investigation of plasma chemistry and temperature

, 2017
Amit P. Shah, Arnab Bhattacharya
semanticscholar   +1 more source