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Fabrication of Anti-Reflective Composite Structures on Inverted Pyramids Using Inductively Coupled Plasma Etching. [PDF]
Micromachines (Basel)Fan Z, Xu L, Zhou B, Chen T.
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Optimization of Soft X-Ray Fresnel Zone Plate Fabrication Through Joint Electron Beam Lithography and Cryo-Etching Techniques. [PDF]
Nanomaterials (Basel)Labani M +5 more
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Ion Mobility and Segregation in Seed Surfaces Subjected to Cold Plasma Treatments. [PDF]
J Agric Food ChemPerea-Brenes A +7 more
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Flexible Embedded Metal Meshes by Nanosphere Lithography for Very Low Sheet Resistance Transparent Electrodes, Joule Heating, and Electromagnetic Interference Shielding. [PDF]
ACS Appl Electron MaterZarei M +4 more
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Reactive ion etching and deep reactive ion etching processes
Other Conferences, 2022Semiconductor technology is a new technology that has only begun to develop in recent decades, but after just a few decades of development, it has become one of the largest industries in the world today, and it exists in many products in our daily lives.
Yih-Fen Wu, Hai-Lin He
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2010
Publisher Summary This chapter discusses the deep reactive ion etching in detail. Reactive Ion Etching (RIE), also known as plasma etching or dry etching, and its extension deep reactive ion etching (DRIE) are processes that combine physical and chemicals effect to remove material from the wafer surface.
Lärmer, Franz +4 more
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Publisher Summary This chapter discusses the deep reactive ion etching in detail. Reactive Ion Etching (RIE), also known as plasma etching or dry etching, and its extension deep reactive ion etching (DRIE) are processes that combine physical and chemicals effect to remove material from the wafer surface.
Lärmer, Franz +4 more
openaire +7 more sources