Polymerization of fluorocarbons in reactive ion etching plasmas [PDF]
, 1998 W. W. Stoffels +2 more
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Sensor systems for real-time feedback control of reactive ion etching [PDF]
, 1996 Tyrone Eugene Benson +11 more
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Doped or Quantum-Dot Layers as In Situ Etch-Stop Indicators for III/V Semiconductor Reactive Ion Etching (RIE) Using Reflectance Anisotropy Spectroscopy (RAS). [PDF]
Micromachines (Basel), 2021 Sombrio G +5 more
europepmc +1 more source
Erratum: “Cathodoluminescence study of GaAs quantum wells and of submicron dots fabricated by magnetron reactive ion etching” [Appl. Phys. Lett. 70, 408 (1997)] [PDF]
, 1997 L.-L. Chao +4 more
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Highly Chemical Reactive Ion Etching of Gallium Nitride [PDF]
, 2000 F. Karouta +7 more
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Formation of Black Silicon in a Process of Plasma Etching with Passivation in a SF6/O2 Gas Mixture
NanomaterialsThis article discusses a method for forming black silicon using plasma etching at a sample temperature range from −20 °C to +20 °C in a mixture of oxygen and sulfur hexafluoride.
Andrey Miakonkikh, Vitaly Kuzmenko
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Deep reactive ion etching of silicon carbide [PDF]
, 2001 Shuji Tanaka +3 more
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On Relationships between Gas-Phase Chemistry and Reactive Ion Etching Kinetics for Silicon-Based Thin Films (SiC, SiO2 and SixNy) in Multi-Component Fluorocarbon Gas Mixtures. [PDF]
Materials (Basel), 2021 Efremov A, Lee BJ, Kwon KH.
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Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching [PDF]
, 2001 Tumura Masashi, Shinzo Yoshikado
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Reactive ion etching of quartz and Pyrex for microelectronic applications [PDF]
, 2002 Dagou A. Zeze +6 more
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