Results 81 to 90 of about 156,728 (358)
Journal of Asian Ceramic Societies, 2021 This report suggests the process of hydrogen doping in vanadium dioxide (VO2) nanobeam using hydrogen plasma, and in turn reveals the modification in the structural, chemical, physical, and electrical properties of VO2 nanobeam that are associated with ...
Hyunwoo Kang +6 more
doaj +1 more source
Advanced Functional Materials, EarlyView.Self‐aligned gate transistors are developed with a single‐step dielectric passivation and fine‐tuning of source/drain electrode work function using phosphonic acid self‐assembled monolayers (SAM). This transistor architecture minimizes overlap capacitances and access resistance.
Linqu Luo +16 more
wiley +1 more source
Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma
Applied Surface Science Advances, 2021 Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke +3 more
doaj
Parylene etching techniques for microfluidics and bioMEMS [PDF]
, 2005 Parylene C (poly(monochloro-p-xylylene)) is a member of a unique family of thermoplastic, crystalline polymers. Compared to other polymers, parylene films are exceptionally conformal and chemically inert owing to its vapor deposition polymerization (VDP)
Meng, Ellis, Tai, Yu-Chong
core +1 more source
Enhanced Terahertz Spectroscopy of a Monolayer Transition Metal Dichalcogenide
Advanced Functional Materials, EarlyView.An ad‐hoc engineered metallic surface is employed to perform enhanced terahertz spectroscopy of a monolayer transition metal dichalcogenide (TMD). Thanks to a local absorption boost of 104, this technique allows for the extraction of the phonon resonance features and effective permittivity of the 2D material, paving the way for the rational design of ...
Xin Jin +11 more
wiley +1 more source
Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2
AIP Advances, 2013 In this study, we have proposed a low-pressure reactive ion etching of bulk polymer materials with a gas mixture of CF4 and O2, and have achieved precise fabrication of poly(methyl methacrylate) (PMMA) and perfluoroalkoxy (PFA) bulk polymer plates with ...
Hirofumi Nabesawa +6 more
doaj +1 more source
Plasma Processing of Large Curved Surfaces for SRF Cavity Modification [PDF]
, 2014 Plasma based surface modification of niobium is a promising alternative to wet etching of superconducting radio frequency (SRF) cavities. The development of the technology based on Cl2/Ar plasma etching has to address several crucial parameters which ...
Im, Do +5 more
core +4 more sources
Sonochemical Functionalization of Glass
Advanced Functional Materials, EarlyView.A new method for functionalizing glass using ultrasonication of aryl diazonium salts. Aryl radicals generated by ultrasounds react with glass, forming a stable, covalently bonded organic film. The functionalized glass adheres microorganisms such as microalgae, fungi, and bacteria, suggesting potential applications in enzyme production, filtration ...
Tiexin Li +13 more
wiley +1 more source
Nd-doped aluminum oxide integrated amplifiers at 880 nm, 1060 nm, and 1330 nm [PDF]
, 2010 Neodymium-doped Al2O3 layers were deposited on thermally oxidized Si substrates and channel waveguides were patterned using reactive-ion etching. Internal net gain on the Nd3+ transitions at 880, 1064, and 1330 nm was investigated,\ud yielding a maximum ...
Ay, F. +4 more
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Advanced Functional Materials, EarlyView.This work investigates modifying interfacial contacts in realizing giant‐performance semiconductor nanomembrane optoelectronics. Strategies, including surface reaction and buffer layer work‐function modulation, are explored to boost the Schottky barrier. An emerging material of YbOx is utilized for near‐ideal Ohmic contact.
Yibo Zhang +5 more
wiley +1 more source