Results 111 to 120 of about 1,741,812 (125)
Some of the next articles are maybe not open access.

Growth control of Ga(As)Sb quantum dots (QD) on GaAs with reflectance anisotropy spectroscopy (RAS)

Proceedings of SPIE, 2014
Ga(As)Sb quantum dots (QDs) are grown on GaAs substrate in the Stranski-Krastanov mode. The molecular beam epitaxial (MBE) growth is monitored by reflectance anisotropy spectroscopy (RAS). For certain photon energies of the light used for RAS, the RAS signal values for GaAs layers, GaSb layers, and Ga(As)Sb QD surface morphologies can clearly be ...
Henning Fouckhardt
exaly   +2 more sources

Atomic layer sensitive in-situ plasma etch depth control with reflectance anisotropy spectroscopy (RAS)

Proceedings of SPIE, 2017
Reflectance anisotropy spectroscopy (RAS) allows for in-situ monitoring of reactive ion etching (RIE) of monocrystalline III-V semiconductor surfaces. Upon use of RAS the sample to be etched is illuminated with broad-band linearly polarized light under nearly normal incidence. Commonly the spectral range is between 1.5 and 5.5 eV.
Henning Fouckhardt   +2 more
exaly   +2 more sources

Reflectance anisotropy spectroscopy on the Ge(113) surface

open access: yesSurface Science, 1996
The clean and hydrogenated Ge(113) surface was investigated using reflectance anisotropy spectrosopy (RAS). Surface-induced optical transitions related to the 3 × 2 reconstruction of the clean surface were identified.
J -T Zettler
exaly   +2 more sources

Formation of GaAsP interface layers monitored by reflectance anisotropy spectroscopy

Journal of Electronic Materials, 1997
Markus Weyers, P Kurpas, A Oster
exaly  

The initial stages of Ge growth on vicinal Si(001) studied by reflectance anisotropy spectroscopy

Surface Science, 1999
Peter Weightman   +2 more
exaly  

Influence of plasma composition on reflectance anisotropy spectra for in situ III–V semiconductor dry-etch monitoring

Applied Surface Science, 2015
Henning Fouckhardt   +2 more
exaly  

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