Results 11 to 20 of about 1,385,401 (335)

Resistance-resistant antibiotics [PDF]

Trends in Pharmacological Sciences, 2014
New antibiotics are needed because drug resistance is increasing while the introduction of new antibiotics is decreasing. We discuss here six possible approaches to develop 'resistance-resistant' antibiotics. First, multitarget inhibitors in which a single compound inhibits more than one target may be easier to develop than conventional combination ...
Eric, Oldfield, Xinxin, Feng
openaire   +2 more sources

Resisting Resistance [PDF]

Annual Review of Cancer Biology, 2017
Targeted therapies, immunotherapies, and improved chemotherapies are being developed to reduce the suffering and mortality that come from human cancer. Although these approaches, and in particular combinations of them, are expected to succeed eventually to a large degree, they all suffer one obstacle: Populations of replicating cells move away ...
Ivana Bozic, Martin A. Nowak
openaire   +1 more source

Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems

Micro and Nano Engineering, 2022
In this contribution we introduce new multilayer (bilayer and trilayer) resist systems for the generation of nanostructures with high aspect ratios of up to 14:1 on 4-in. full wafer scale.
Thomas Handte, Nicolas Scheller, Lars Dittrich, Manuel W. Thesen, Martin Messerschmidt, Stefan Sinzinger   +5 more
doaj   +1 more source

Resistant Hypertension [PDF]

The American Journal of Medicine, 2015
N ...
ROMANO, Simone, Chacko, Satish J, Rangarajan, Vibhav, Chung, Jaehoon, Farzaneh Far, Afshin   +4 more
openaire   +6 more sources

β-Lactamase Genes without Limits

Microorganisms, 2023
β-Lactams are among the most prescribed antibiotics worldwide, mainly due to their weak toxicity and good efficacy [...]
Thierry Naas, Laura Dabos, Rémy A. Bonnin   +2 more
doaj   +1 more source

A single Proteus mirabilis lineage from human and animal sources: a hidden reservoir of OXA-23 or OXA-58 carbapenemases in Enterobacterales

Scientific Reports, 2020
In Enterobacterales, the most common carbapenemases are Ambler’s class A (KPC-like), class B (NDM-, VIM- or IMP-like) or class D (OXA-48-like) enzymes. This study describes the characterization of twenty-four OXA-23 or OXA-58 producing-Proteus mirabilis ...
Rémy A. Bonnin, Delphine Girlich, Agnès B. Jousset, Lauraine Gauthier, Gaëlle Cuzon, Pierre Bogaerts, Marisa Haenni, Jean-Yves Madec, Elodie Couvé-Deacon, Olivier Barraud, Nicolas Fortineau, Philippe Glaser, Youri Glupczynski, Laurent Dortet, Thierry Naas   +14 more
doaj   +1 more source

Laser Direct Writing of Thick Hybrid Polymers for Microfluidic Chips

Micromachines, 2014
This work presents patterning of thick (10–50 µm) hybrid polymer structures of ORMOCER® by laser direct writing. ORMOCER® combine polymer-like fabrication processes with glass-like surface chemistry that is beneficial for many bio-microfluidic ...
Akanksha Singh, Gianmario Scotti, Tiina Sikanen, Ville Jokinen, Sami Franssila   +4 more
doaj   +1 more source

A study of imprint and etching behavior on fused silica of a new tailored resist mr-NIL213FC for soft UV-NIL

Micro and Nano Engineering, 2020
A new type of a specifically tailored resist for Soft Nanoimprint Lithography (Soft UV-NIL) namely mr-NIL213FC has been developed. It aims for a significant improvement of its etch-resistance with regard to underlying oxide substrates such as glass. This
Shuhao Si, C. Weigel, M. Messerschmidt, M.W. Thesen, S. Sinzinger, S. Strehle   +5 more
doaj   +1 more source

In vitro Activity of Cefiderocol and Comparators against Carbapenem-Resistant Gram-Negative Pathogens from France and Belgium

Antibiotics, 2022
Infections with carbapenem-resistant (CR) Gram-negative (GN) pathogens have increased in many countries worldwide, leaving only few therapeutic options.
Saoussen Oueslati, Pierre Bogaerts, Laurent Dortet, Sandrine Bernabeu, Hend Ben Lakhal, Christopher Longshaw, Youri Glupczynski, Thierry Naas   +7 more
doaj   +1 more source

Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication

Applied Sciences, 2012
The generated resist based defects on the template in addition to the presence of particles and contaminants is critical for ultraviolet curing of nanoimprint lithographic fabrication.
Satoshi Takei, Atsushi Sekiguchi
doaj   +1 more source