Results 11 to 20 of about 475,541 (366)

Methodology and practical application of an ArF resist model calibration

, 2022
S.1031-1039This paper focuses on a novel methodology for a fast and efficient resist model calibration. One of the most crucial parts when calibrating a resist model is the fitting of experimental data where up to 20 resist model parameters are varied ...
Küchler, B., Elian, K., Ziebold, R., Rößiger, M., Tollkühn, B., Nölscher, C.   +5 more
core   +1 more source

Some aspects of thick film resist performance and modeling

, 2022
S.1201ffRealistic simulation of DNQ-novolac thick film resist performance requires accurate modeling of a number of steps including light propagation inside the resist and the development process.
Erdmann, A., Dammel, R.R., Willson, C.G., Henderson, C.L.   +3 more
core   +1 more source

Evaluation of the EasyScreen™ ESBL/CPO Detection Kit for the Detection of ß-Lactam Resistance Genes

Diagnostics, 2022
Early detection of multidrug resistant bacteria is of paramount importance for implementing appropriate infection control strategies and proper antibacterial therapies.
Camille Gonzalez, Saoussen Oueslati, Laura Biez, Laurent Dortet, Thierry Naas   +4 more
doaj   +1 more source

Demonstration of 22nm SRAM features with patternable hafnium oxide based resist material using electron-beam lithography

, 2022
Paper 832518To fulfill the requirements of future technology nodes new resists with high resolution, high sensitivity and low LWR and LER respectively are needed. A new inorganic non-chemically amplified resist (XE15IB, an experimental resist provided by
Freitag, Martin, Hohle, Christoph, Grenville, Andrew, Stowers, Jason K., Gutsch, Manuela, Choi, Kang-Hoon, Thrun, Xaver, Bartha, Johann W.   +7 more
core   +1 more source

Resist-Free Lithography for Monolayer Transition Metal Dichalcogenides

, 2022
Photolithography and electron-beam lithography are the most common methods for making nanoscale devices from semiconductors. While these methods are robust for bulk materials, they disturb the electrical properties of two-dimensional (2D) materials ...
Yu Zhong (291917), Myungjae Lee (1603171), Jaehyung Yu (5908592), Preeti K. Poddar (11926694), Andrew J. Mannix (1486705), Jong-Hoon Kang (5737751), Fauzia Mujid (7304945), Saien Xie (2627689), Jiwoong Park (1661347), Ce Liang (8307540)   +9 more
core   +1 more source

Manufacturing of nanostructures with high aspect ratios using soft UV-nanoimprint lithography with bi- and trilayer resist systems

Micro and Nano Engineering, 2022
In this contribution we introduce new multilayer (bilayer and trilayer) resist systems for the generation of nanostructures with high aspect ratios of up to 14:1 on 4-in. full wafer scale.
Thomas Handte, Nicolas Scheller, Lars Dittrich, Manuel W. Thesen, Martin Messerschmidt, Stefan Sinzinger   +5 more
doaj   +1 more source

Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography

, 2022
Paper 86820ZResist processing for future technology nodes becomes more and more complex. The resist film thickness is getting thinner and hardmask concepts (trilayer) are needed for reproducible etch transfer into the stack.
Hohle, Christoph, Guerrero, Douglas, Choi, Kang-Hoon, Figueiro, Thiago, Hanisch, Norbert, Thrun, Xaver, Steidel, Katja, Bartha, Johann W.   +7 more
core   +1 more source

Nanoimprint Resist Material Containing Ultraviolet Reactive Fluorine Surfactant for Defect Reduction in Lithographic Fabrication

Applied Sciences, 2012
The generated resist based defects on the template in addition to the presence of particles and contaminants is critical for ultraviolet curing of nanoimprint lithographic fabrication.
Satoshi Takei, Atsushi Sekiguchi
doaj   +1 more source

A single Proteus mirabilis lineage from human and animal sources: a hidden reservoir of OXA-23 or OXA-58 carbapenemases in Enterobacterales

Scientific Reports, 2020
In Enterobacterales, the most common carbapenemases are Ambler’s class A (KPC-like), class B (NDM-, VIM- or IMP-like) or class D (OXA-48-like) enzymes. This study describes the characterization of twenty-four OXA-23 or OXA-58 producing-Proteus mirabilis ...
Rémy A. Bonnin, Delphine Girlich, Agnès B. Jousset, Lauraine Gauthier, Gaëlle Cuzon, Pierre Bogaerts, Marisa Haenni, Jean-Yves Madec, Elodie Couvé-Deacon, Olivier Barraud, Nicolas Fortineau, Philippe Glaser, Youri Glupczynski, Laurent Dortet, Thierry Naas   +14 more
doaj   +1 more source

β-Lactamase Genes without Limits

Microorganisms, 2023
β-Lactams are among the most prescribed antibiotics worldwide, mainly due to their weak toxicity and good efficacy [...]
Thierry Naas, Laura Dabos, Rémy A. Bonnin   +2 more
doaj   +1 more source