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Molecular Layer Deposition of a Hafnium-Based Hybrid Thin Film as an Electron Beam Resist
ACS Applied Materials & Interfaces, 2022Jingwei Shi +2 more
exaly
Efavirenz: resistance and cross-resistance.
International journal of clinical practice. Supplement, 1999Resistant strains, the major cause of treatment failure in the management of HIV infection, evolve whenever virus replication is incompletely suppressed by drug therapy. In such cases, genotypic analysis of proviral DNA or phenotypic analysis of viral isolates or recombinant molecular clones can provide useful information for the clinician. With regard
openaire +2 more sources
Oxygen plasma etching for resist stripping and multilayer lithography
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1989M A Hartney, D W Hess, D S Soane
exaly
Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist
ACS Nano, 2014Celal Con
exaly

