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Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist
Microelectronic Engineering, 2018Andrea Cattoni +2 more
exaly
Utilization of biopolymer in resist printing of linen fabrics using reactive dyes
Carbohydrate Polymers, 2013M Rekaby, H M El-Hennawi, A A Ragheb
exaly
Resist heating effect in direct electron beam writing
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1988Tadahiro Takigawa
exaly
Exploring the high sensitivity of SU-8 resist for high resolution electron beam patterning
Microelectronic Engineering, 2004Vincent Studer
exaly
Large Area ResistāFree Soft Lithographic Patterning of Graphene
Small, 2013Antony George +2 more
exaly

