Results 61 to 70 of about 1,998,168 (383)

Organoids in pediatric cancer research

FEBS Letters, EarlyView.
Organoid technology has revolutionized cancer research, yet its application in pediatric oncology remains limited. Recent advances have enabled the development of pediatric tumor organoids, offering new insights into disease biology, treatment response, and interactions with the tumor microenvironment.
Carla Ríos Arceo, Jarno Drost
wiley   +1 more source

S100-Alarmins Are Essential Pilots of Postnatal Innate Immune Adaptation

Frontiers in Immunology, 2020
The restricted capacity of newborn infants to mount inflammatory responses toward microbial challenges has traditionally been linked to the high risk of septic diseases during the neonatal period.
Dorothee Viemann, Dorothee Viemann, Dorothee Viemann   +2 more
doaj   +1 more source

Nanoscale Printing of Indium-Tin-Oxide by Femtosecond Laser Pulses

Nanomaterials, 2022
For constructing optical and electrical micro-devices, the deposition/printing of materials with sub-1 μm precision and size (cross-section) is required.
Jingwen Hu, Zhen-Ze Li, Yang-Yang Zhao, Yi-Shi Xu, Lin Wang, Molong Han, Lachlan Hyde, Soon Hock Ng, Lei Wang, Saulius Juodkazis   +9 more
doaj   +1 more source

Systemization of Pluggable Transports for Censorship Resistance [PDF]

, 2016
An increasing number of countries implement Internet censorship at different scales and for a variety of reasons. In particular, the link between the censored client and entry point to the uncensored network is a frequent target of censorship due to the ...
Khattak, Sheharbano, Murdoch, Steven J., Simon, Laurent   +2 more
core  

Photoresist patterned thick-film piezoelectric elements on silicon

, 2007
A fundamental limitation of screen printing is the achievable alignment accuracy and resolution. This paper presents details of a thick-resist process that improves both of these factors.
Beeby, S. P., Frood, A. J. M., Tudor, M. J., White, N. M.   +3 more
core   +1 more source

Multibridge VO2-Based Resistive Switching Devices in a Two-Terminal Configuration [PDF]

, 2023
Xing Gao, Thijs J. Roskamp, Timm Swoboda, Carlos M. M. Rosário, Sander Smink, Miguel Muñoz Rojo, H. Hilgenkamp   +6 more
openalex   +1 more source

Reciprocal control of viral infection and phosphoinositide dynamics

FEBS Letters, EarlyView.
Phosphoinositides, although scarce, regulate key cellular processes, including membrane dynamics and signaling. Viruses exploit these lipids to support their entry, replication, assembly, and egress. The central role of phosphoinositides in infection highlights phosphoinositide metabolism as a promising antiviral target.
Marie Déborah Bancilhon, Bruno Mesmin
wiley   +1 more source

Controlled Cross‐Linking for Water Developable Hf‐Based Dry Resist Prepared via Molecular Layer Deposition

Small Structures
Metal‐containing hybrid resists have attracted considerable attention for advanced lithography owing to their superior performance in resolution, sensitivity, and etch resistance.Beyond these benefits, vapor‐deposited dry hybrid resists offer distinct ...
Yixian Wang, Chao Shi, Bin Liu, Linyang Li, Chujun Wang, Yuan Cai, Lanxin Guo, Jian Pan, Hu Gong, Tuo Wang, Jinlong Gong   +10 more
doaj   +1 more source

Evaluation of the Reveal^® AST (SPECIFIC) for Antimicrobial Susceptibility Testing from Positive Blood Culture Spiked with Carbapenem-Resistant Isolates

Pathogens
As bloodstream infections and associated septic shock are common causes of mortality in hospitals, rapid antibiotic susceptibility testing (AST) performed directly on positive blood cultures is needed to implement an efficient therapy in clinical ...
Delphine Girlich, Agnès B. Jousset, Cécile Emeraud, Inès Rezzoug, Reece Burwell, Pragya Singh, Paul A. Rhodes, Thierry Naas, Rémy A. Bonnin, Laurent Dortet   +9 more
doaj   +1 more source

Novel EUV resist development for sub-14nm half pitch

Advanced Lithography, 2015
Extreme ultraviolet (EUV) lithography has emerged as a promising candidate for the manufacturing of semiconductor devices at the sub-14nm half pitch lines and spaces (LS) pattern for 7 nm node and beyond.
M. Hori, Takehiko Naruoka, H. Nakagawa, Tomohisa Fujisawa, T. Kimoto, M. Shiratani, Tomoki Nagai, R. Ayothi, Y. Hishiro, K. Hoshiko, Tōru Kimura   +10 more
semanticscholar   +1 more source