Results 181 to 190 of about 40,757 (206)

Sputtering of Metal Oxides with an rf-Ion Source

Optical Interference Coatings, 1988
Ion beam of relatively low energy and large area have become a valueable tool in thin film production. The energies for the most important processes are several ten to several hundered eV for etching and ion assisted evaporation and several thousand eV for sputtering.
Ingo Kessler, Juergen Mueller, Gerhard Steiniger   +2 more
openaire   +1 more source

RF absorption and ion heating in helicon sources

IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340), 2003
Summary form only given, as follows. Initial ion temperature measurements in The Hot hELIcon eXperiment (HELIX) helicon source showed that the ion temperature is non-negligible and can be as high as 1 eV. The measurements also showed that the ion temperature scales with magnetic field strength and that the ion temperature is anisotropic with respect to
J.L. Kline, E.E. Scime, R.F. Boivin, A.M. Keesee, X. Sun   +4 more
openaire   +1 more source

RF H⁻ Ion Source with Saddle Antenna

2010
In this project we are developing an RF H⁻ surface plasma source which will synthesize the most important developments in the field of negative ion sources to provide high pulsed and average current, high brightness, good lifetime, high reliability, and higher power efficiency.
Dudnikov, Vadim, Dudnikova, Galina, Johnson, Rolland, Stockli, Martin, Welton, Robert   +4 more
openaire   +1 more source

CHARACTERISTICS OF LOW POWER RF ION SOURCE

Problems of Atomic Science and Technology
The main characteristics of a low-power inductive RF ion source designed for use in a compact nuclear microprobe at the IAP NASU are presented. The source operates at a frequency of 45 MHz with RF power below 10 W. The extracted beam current reaches up to 3.5 µA through a 0.6 mm diameter aperture. The beam is composed of 1H+, 2H+, and 3H+ ions, and the
V.I. Voznyi, A.G. Ponomarev, D.V. Magilin, D.P. Shulha, V.A. Rebrov   +4 more
openaire   +1 more source

Development and applications of the RF-driven ion source

The 30th International Conference on Plasma Science, 2003. ICOPS 2003. IEEE Conference Record - Abstracts., 2003
Summary form only given, as follows. RF driven ion sources have been developed at the Lawrence Berkeley National Laboratory for more than a decade. This type of ion source can be operated with 2 or 13.5 MHz in either cw or pulsed mode for positive or negative ion beam production.
openaire   +1 more source

The plasma impedance of RF-ion sources

13th International Electric Propulsion Conference, 1978
B. LENZ, R. WALTHER, H. LOEB
openaire   +1 more source

Production of Metallic and Other Ions in rf Ion Source

Review of Scientific Instruments, 1966
R. S. Hall, D. H. Poole, M. S. Stagg
openaire   +1 more source

Ion Source—Thermal and Thermomechanical Simulation

Aerospace, 2021
Victoria V Svotina
exaly  

Effects of ion extraction on discharges in gridded ion source

AIP Advances, 2022
Y R Yang, S H Fu, Z F Ding
exaly  

A new off-line ion source facility at IGISOL

Nuclear Instruments & Methods in Physics Research B, 2020
M Vilen, L Canete, B Cheal
exaly