Results 241 to 250 of about 66,890 (252)

Application of high‐rate E×B or magnetron sputtering in the metallization of semiconductor devices

Journal of Vacuum Science and Technology, 1976
exaly  

Semiconductor device

2015
MINOTANI SHUHEI, NAKANO YUUKI, WATABE HEIJI, SHIMURA TAKAYOSHI, HOSOI TAKUJI, KIRINO TAKASHI   +5 more
openaire   +11 more sources

Semiconductor device

1998
IWAKI TADAO, YAMAZAKI TSUNEO, MATSUSHITA KATSUKI, SENBONMATSU SHIGERU, TAKANO RYUICHI   +4 more
openaire   +2 more sources

Semiconductor device

2010
MASUOKA FUJIO, NAKAMURA HIROKI
openaire   +2 more sources

Semiconductor device

2000
KAWASAKI MASASHI, OHNO HIDEO, OHTOMO AKIRA   +2 more
openaire   +2 more sources

SEMICONDUCTOR DEVICE

2003
YAMASHITA KENYA, KITABATAKE MAKOTO, KUSUMOTO OSAMU, TAKAHASHI KUNIMASA, UCHIDA MASAO, MIYANAGA RYOKO   +5 more
openaire   +4 more sources

Semiconductor devices.

1985
FIDDYMENT PHILIP JOHN, WESTBROOK LESLIE DAVID, NELSON ANDREW WILLIAM   +2 more
openaire   +3 more sources

SEMICONDUCTOR DEVICES

1988
SCOVELL, PETER DENIS, BAKER, ROGER LESLIE, BLOMLEY, PETER FRED, TOMKINS, GARY JOHN   +3 more
openaire   +4 more sources

SEMICONDUCTOR DEVICE

2006
OHMI TADAHIRO, TERAMOTO AKINOBU
openaire   +3 more sources

Semiconductor device.

1985
PELGROM, MARCELLINUS JOHANNES MARIA, HARWIG, HENDRIK ANNE, SLOTBOOM, JAN WILLEM   +2 more
openaire   +2 more sources