Results 71 to 80 of about 19,251 (262)
Pure SF6 and SF6-N-2 Mixture Gas Hydrates Equilibrium and Kinetic Characteristics
, 2009 Sulfur hexafluoride (SF6), whether pure or mixed with inexpensive inert gas, has been widely used in a variety of industrial processes, but it is one of the most potent greenhouse gases For this reason, it is necessary to separate and/or collect it from ...
Lee, EK +10 more
core +1 more source
Thin Fluoride Insulators for Improved 2D Transistors: From Deposition Methods to Recent Applications
physica status solidi (RRL) – Rapid Research Letters, EarlyView.2D materials hold significant promise for next‐generation electronic and optoelectronic devices, but suitable gate dielectrics are still a challenge. Fluoride insulators, offering inert, dangling‐bond‐free surfaces, have recently emerged as strong candidates. This review covers recent publications on high‐quality fluoride thin‐film deposition and their
Behzad Dadashnia +3 more
wiley +1 more source
Characterization of uncertainties in atmospheric trace gas inversions using hierarchical Bayesian methods [PDF]
, 2014 We present a hierarchical Bayesian method for atmospheric trace gas inversions. This method is used to estimate emissions of trace gases as well as "hyper-parameters" that characterize the probability density functions (PDFs) of the a priori emissions ...
Li, S. +37 more
core +1 more source
Low Temperature Site‐Specific Pulsed Laser Annealing of MoS2
Small, EarlyView.The application of laser pulses, of extremely short duration, is investigated as a potential new method to modify the atomic structure of ultrathin 2D materials for use in the creation of future electrical devices. The process is efficient, offering a site‐specific functionality, where regions of an electronic device that only requires annealing is ...
Nazar Farid +13 more
wiley +1 more source
Production of non-stoichiometric SF6 cluster anions by electron attachment to SF6 clusters
, 1993 We report here on the detection of (SF6)n·X− (X = SF5, SF4, SF3) ions which form by electron attachment to SF6 clusters in a molecular beam. The formation of some species, e.g.
Mark, Tilmann D. +5 more
core +1 more source
Polarity‐engineered Sn‐Ti cluster photoresists for sub‐10‐nm high‐resolution lithography
Smart Molecules, EarlyView.Enhancing the polarity of clusters can optimize their patterning performance; inspired by this strategy, we designed polarity‐enhanced Sn‐Ti oxo clusters via ligand engineering. The optimal TS‐3 with exposure‐induced polarity switch achieves 8 nm patterning in lithography and achieves simultaneous improvement in resolution and patterning performance ...
Daohan Wang +10 more
wiley +1 more source
Gaoya dianqi, 2016 利用SF6分解组分对GIS绝缘状态进行诊断,必须解决SF6分解特征组分的定性和定量检测的关键技术难题,这直接关系到对设备故障性质和程度判断的准确性。文中采用称量法,研究以SF6为背景气的气体标准物质的制备过程与方法,成功研制了CO2/SF6、CF4/SF6、SOF2/SF6、SO2F2/SF64种标准气体物质,解决了SF6分解特征组分标准气体物质的存储问题,考察了4种气体标准物质的一致性、压力稳定性以及长期稳定性。结果表明:CO2/SF6、CF4/SF6、SOF2/SF6和SO2F2 ...
苗玉龙 +4 more
doaj
Smart Molecules, EarlyView.Electron‐beam induced C–F cleavage in –CF3 generates F−, which abstracts a proton to form the acid that catalyzes tBMA deprotection during post‐exposure baking. This self‐sensitization mechanism enables the precise formation of high‐resolution negative‐tone patterns with enhanced sensitivity and resolution.
Yuting Tang +9 more
wiley +1 more source
Small Structures, Volume 6, Issue 5, May 2025.A novel spatial segregation strategy for silicon photoelectrodes is demonstrated, where catalyst wires surrounded by tapered microwires effectively decouple competing optical and catalytic requirements. This architectural innovation enables optimal light absorption and catalytic activity while maintaining efficient charge transport, achieving 96.5 ...
Soohyeok Park +9 more
wiley +1 more source
Time series of sulfur hexafluoride SF6 concentration at MaceHead in 2011
, 2017 Time series of sulfur hexafluoride SF6 concentration at MaceHead in ...
Alistair Manning (8020613) +9 more
core +1 more source