Results 61 to 70 of about 592,847 (241)
The Effect of Substrate Crystal Orientations on Surface Properties of SiC Thin Layer Grown by MBE
Silicon carbide is expected to be used as a next-generation material because of its more effective mechanical and electronic properties. The hetero Molecular Beam Epitaxy process may provide a method to form thin layered mono-crystal Silicon carbide on a
Akira KAKUTA +2 more
doaj +1 more source
Ultrathin MXene/EMF composite foams achieve a specific shielding efficiency of 749.6 dB.dB·cm3$\mathrm{dB}\cdot {\mathrm{cm}}^{3}$/g, while the silver‐enhanced MXene/Ag/EMF reaches 81.4 dB shielding effectiveness at just 1.0 mm thickness. Both composites exhibit rapid Joule heating, retain stability up to 250∘C$^\circ{\rm C}$, and withstand 1000 ...
Abdullah A. Mahmood +7 more
wiley +1 more source
Comparison of silicon oxide and silicon carbide absorber materials in silicon thin-film solar cells
Since solar energy conversion by photovoltaics is most efficient for photon energies at the bandgap of the absorbing material the idea of combining absorber layers with different bandgaps in a multijunction cell has become popular.
Walder Cordula +5 more
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Silicon carbide nanowires have been synthesized at 1400 °C by carbothermic reduction of silica with bamboo carbon under normal atmosphere pressure without metallic catalyst.
Luo Xiaogang +5 more
doaj +1 more source
Silicon carbide has been used in a variety of applications including solar cells due to its high stability. The high bandgap of pristine SiC, necessitates nonstoichiometric silicon carbide materials to be considered to tune the band gap for efficient ...
Noura D. Alkhaldi +2 more
doaj +1 more source
Halogen Surface Terminations in Ti3C2 MXenes for Interface Engineering in Perovskite Solar Cells
Controlled halogen surface terminations in Ti3C2${\rm Ti}_3{\rm C}_2$ MXenes enable the isolation of structure‐property relationships, revealing how –Cl and –Br terminations influence interlayer spacing, electronic behavior, and work function. When incorporated into IT‐4F‐based interfacial layers, these MXenes modulate interfacial processes and device ...
Morgana Müller de França +10 more
wiley +1 more source
Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley +1 more source
Development Of Si02 Thin Film On singlecrystal Sic By anodic oxidation technique. [PDF]
Anodic silicon dioxide (Si02) thin film is growth on p- and n-type silicon (Si) and p-type 4H-silicon carbide (SiC) substrate with the thickness ranging from 50-130 nm.
Cheong, Kuan Yew +2 more
core +1 more source
Silicon carbide fibers have superior flexural properties and chemical stability compared to glass fibers. We investigated the flexural strength and modulus of an experimental, short silicon carbide fiber-reinforced resin.
Norimasa Taka +4 more
doaj +1 more source
Experimental investigation of semiconductor structures of the power source based on carbon-14
The article presents the research results of semiconductor silicon carbide (porous) structures with the implanted carbon-14. The results of experimental measurements collected data on parameters of photovoltaic energy conversion of light quanta into a ...
V.I. Chepurnov +4 more
doaj +1 more source

