Results 191 to 200 of about 510,378 (292)

A Scalable Perovskite Platform With Multi‐State Photoresponsivity for In‐Sensor Saliency Detection

open access: yesAdvanced Materials, EarlyView.
A scalable in‐sensor computing platform (32 × 32 array) with ultra‐low variability is developed by incorporating ferroelectric copolymers into halide perovskite thin films. These devices achieve 1000 programmable photoresponsivity states and high thermal reliability.
Xuechao Xing   +10 more
wiley   +1 more source

Photocatalytic Water Splitting on the Lunar Surface: Prospects for In Situ Resource Utilization

open access: yesAdvanced Materials Interfaces, EarlyView.
Water has been found in craters on the moon nearby locations which are illuminated >80% of the time. Photocatalysis uses energy from sunlight to drive chemical reactions such as water splitting to produce oxygen and hydrogen. It is a scalable technology that requires lighter equipment and utilizes resources available on the moon. ABSTRACT The discovery
Ranjani Kalyan   +6 more
wiley   +1 more source

Light‐Controlled Exposure of Cancer Cells to Reactive Oxygen Species Using Organic Semiconductor Thin Films

open access: yesAdvanced Materials Interfaces, EarlyView.
Spin‐coated films of the conjugated polymer F8T2 (poly (9,9‐dioctylfluorene‐alt‐bithiophene)) generate superoxide at the film‐medium interface, enabling precise delivery of reactive oxygen species (ROS) as visible‐light “ROS patches.” Coated surfaces drive rapid, localised cytotoxicity in MCF7 cancer monolayers under white light, providing a reagent ...
Joe Kaye   +8 more
wiley   +1 more source

The IMAP Observatory Overview. [PDF]

open access: yesSpace Sci Rev
Hegarty KP   +43 more
europepmc   +1 more source

Impact of Oxygen Plasma Pre‐Treatment on Thermal Oxidation and Reliability of SiO2 on 4H‐SiC

open access: yesAdvanced Materials Interfaces, EarlyView.
We investigate how oxygen plasma pre‐treatment affects the thermal oxidation of silicon carbide. While plasma modification increases growth rates by 84%, it reduces dielectric breakdown strength by 18%. Our findings reveal that although plasma improves the interface state density, it introduces structural damage, highlighting a critical trade‐off ...
Chezhiyan Nanjappan   +3 more
wiley   +1 more source

Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiNx for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles

open access: yesAdvanced Materials Interfaces, EarlyView.
Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim   +7 more
wiley   +1 more source

Home - About - Disclaimer - Privacy