Results 281 to 290 of about 389,974 (331)

The sputtering process and sputtered ion emission

Surface Science, 1979
Abstract In this review an attempt is made to delineate those physical characteristics of the sputtering event which are of importance for the discussion of sputtered ion emission. Emphasis is placed on the grossly disordered nature of the sputtering site as the sputtered atoms depart.
openaire   +1 more source

Measurement of sputtering by sputter deposition method

Physics Letters A, 1989
Abstract Sputtering with energetic ion bombardment is investigated by measuring the angular distribution of ejected material and by analyzing the bombarded sample surface with Auger electron spectroscopy (AES). The results show that the ejection events strongly depend upon type, fluence and energy of the bombarding ions and sputtering environments ...
openaire   +1 more source

Fundamentals of Sputtering

1984
From a user’s point of view, one would wish that a secondary-ion-mass-spectroscopic (SIMS) signal [1,2] S be given by S=YP, where Y is a sputter yield and P an ionization probability. As we all know, things are more complex. As a next step, one could write schematically $$S\left( {x,y} \right) = \smallint dz Y\left( {x;y,z} \right) P\left( {y,z ...
openaire   +2 more sources

Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

, 1969
P. Sigmund
semanticscholar   +1 more source

Neutron sputtering

Nuclear Instruments and Methods, 1976
openaire   +2 more sources

A unified treatment of self-sputtering, process gas recycling, and runaway for high power impulse sputtering magnetrons

, 2017
N. Brenning, J. T. Gudmundsson, M. Raadu, T. J. Petty, T. Minea, D. Lundin   +5 more
semanticscholar   +1 more source

Sputtering of rough surfaces: a 3D simulation study

, 2017
U. von Toussaint, A. Mutzke, A. Manhard
semanticscholar   +1 more source

Synthesis and characterization of large-area and continuous MoS2 atomic layers by RF magnetron sputtering.

Nanoscale, 2016
S. Hussain, M. A. Shehzad, Dhanasekaran Vikraman, Muhammad Farooq Khan, Jai Singh, Dong-Chul Choi, Y. Seo, J. Eom, Wan-Gyu Lee, Jongwan Jung   +9 more
semanticscholar   +1 more source

High-mobility thin-film transistor with amorphous InGaZnO4 channel fabricated by room temperature rf-magnetron sputtering

, 2006
H. Yabuta, M. Sano, K. Abe, T. Aiba, T. Den, H. Kumomi, K. Nomura, T. Kamiya, H. Hosono   +8 more
semanticscholar   +1 more source

Growth of wafer-scale MoS2 monolayer by magnetron sputtering.

Nanoscale, 2015
J. Tao, J. Chai, Xin Lu, L. Wong, T. I. Wong, Jisheng Pan, Q. Xiong, D. Chi, Shijie Wang   +8 more
semanticscholar   +1 more source