Results 231 to 240 of about 1,433,720 (323)

LFA: A Lattice Fourier Analyzer for Quantitative In Situ EC‐STM of Adsorbate–Substrate Superstructures

open access: yesAdvanced Materials Interfaces, EarlyView.
Although electrochemical scanning tunneling microscopy provides atomic‐scale access to electrified interfaces, quantitative in situ and operando investigations suffer from drift‐induced distortions. This work introduces the Lattice Fourier Analyzer (LFA), which employs substrate‐anchored affine drift correction in reciprocal space to recover precise ...
Rafał Lewandków   +4 more
wiley   +1 more source

Enhancing start-up and torque in Darrieus VAWTs through a novel plain gurney flap design. [PDF]

open access: yesSci Rep
Eltayeb W   +4 more
europepmc   +1 more source

A Reusable Polymeric Sensor Based on Green‐Synthesized CQDs@ZIF‐8 for the Rapid Detection of Nitro‐Explosive Picric Acid

open access: yesAdvanced Materials Interfaces, EarlyView.
This study presents the rational design and synthesis of a highly luminescent polymeric nanocomposite. Initially, highly fluorescent carbon quantum dots (CQDs) are synthesized via a facile hydrothermal method using citric acid and β‐alanine as precursors, followed by rigorous purification through centrifugation and filtration.
Yunus Emre Toprak   +2 more
wiley   +1 more source

Mechanical Stress Evolution in Polycrystalline Ge Thin Films Under MeV Ion Irradiation

open access: yesAdvanced Materials Interfaces, EarlyView.
Irradiation of polycrystalline Ge thin films with 1.8 MeV Au ions alters residual stress through defect generation and lattice expansion. Increasing fluence drives progressive lattice disorder and eventual amorphization. Polycrystalline Ge resists amorphization longer than crystalline Ge, as grain boundaries facilitate defect diffusion, significantly ...
Karla J. Paz Corrales   +10 more
wiley   +1 more source

Atomic Layer Deposition of Metallic Molybdenum Dioxide Thin Films Enabling High‐k Rutile Capacitors

open access: yesAdvanced Materials Interfaces, EarlyView.
The first direct atomic layer deposition (ALD) process of molybdenum dioxide (MoO2) thin films is reported using molybdenum(II) acetate dimer (Mo2(OAc)4) and oxygen (O2) as precursors at 235°C–275°C. The films are crystalline, exceptionally pure, and conductive.
Alexey Ganzhinov   +8 more
wiley   +1 more source

One‐Step Fabrication of Highly Transparent Superhydrophobic Coatings Via Atmospheric Pressure Radio Frequency Plasma Deposition

open access: yesAdvanced Materials Interfaces, EarlyView.
Atmospheric‐pressure RF plasma deposition enables the fabrication of transparent, superhydrophobic coatings with anti‐reflective functionality. Process optimization yields high optical transmittance, robust environmental stability, and self‐cleaning properties.
Sultan S. Ussenkhan   +7 more
wiley   +1 more source

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