Results 191 to 200 of about 18,944,392 (366)

Laser‐Synthesized Amorphous PdSe2‐x Nanoparticles: A Defect‐Rich Platform for High‐Efficiency SERS, Photocatalysis, and Photothermal Conversion

open access: yesAdvanced Materials Interfaces, EarlyView.
Using femtosecond ablation, we show that an ordered, stoichiometric crystalline PdSe2 target can be controllably converted into a stable, disordered, non‐stoichiometric, and highly functional amorphous nanomaterial, PdSe2−x${\rm PdSe}_{2-x}$. The obtained nanoparticles offer significant advantages over conventional planar plasmon‐free substrates due to
Andrei Ushkov   +18 more
wiley   +1 more source

Strategies for Enhancing Thermal Conductivity of PDMS in Electronic Applications

open access: yesAdvanced Materials Technologies, EarlyView.
This review explores effective strategies for enhancing heat dissipation in Polydimethylsiloxane (PDMS)‐based composites, focusing on particle optimization, 3D network design, and multifunctional integration. It offers key insights into cutting‐edge methods and simulations that are advancing thermal management in modern electronic devices.
Xiang Yan, Marisol Martin‐Gonzalez
wiley   +1 more source

Quantum bioelectrochemical (QBIOL) software based on point stochastic processes. [PDF]

open access: yesCommun Chem
Grall S   +9 more
europepmc   +1 more source

Advanced Design for Weakly Coupled Resonators by Automatic Active Optimization

open access: yesAdvanced Materials Technologies, EarlyView.
An Automatic Active Optimization (AAO) strategy integrates machine learning predictors and genetic algorithms in a closed‐loop workflow. By iteratively expanding its dataset with new discoveries, AAO overcomes the limits of conventional methods. This approach finds superior microstructural designs beyond the initial sample space. We demonstrate this on
Wei Yue   +8 more
wiley   +1 more source

Symmetry Classes of Classical Stochastic Processes. [PDF]

open access: yesJ Stat Phys
Sá L, Ribeiro P, Prosen T, Bernard D.
europepmc   +1 more source

Molecular Layer Deposited Aluminum‐Based Hybrid Resist for High‐Resolution Nanolithography and Direct Ultra‐High Aspect Ratio Pattern Transfer

open access: yesAdvanced Materials Technologies, EarlyView.
This study demonstrates an aluminum‐based hybrid photoresist synthesized via molecular layer deposition (MLD) using trimethylaluminum and hydroquinone. The resist achieves sub‐20 nm resolution and virtually infinite silicon etch selectivity, enabling 40 nm‐wide, micrometer‐tall nanostructures.
Won‐Il Lee   +8 more
wiley   +1 more source

Exploring nonlinear chaotic systems with applications in stochastic processes. [PDF]

open access: yesSci Rep
Abdelwahed HG   +5 more
europepmc   +1 more source

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