Results 151 to 160 of about 2,899,334 (284)

Descriptors to Dynamics: A Materials and Device Perspective on in‐Materio Physical Reservoir Computing for Neuromorphic Edge Intelligence

open access: yesAdvanced Materials, EarlyView.
Intrinsic material dynamics are harnessed as computational resources for neuromorphic in‐materio physical reservoir computing. Defects, ionic motion, interfaces, percolation, geometry, and biasing shape transient states that provide fading memory, nonlinearity, and high‐dimensional projection for simple readout. A descriptor‐to‐dynamics framework links
Kshitij RB Singh   +5 more
wiley   +1 more source

Stochastic Stability in the Best Shot Game [PDF]

open access: yes
The best shot game applied to networks is a discrete model of many processes of contribution to local public goods. It has generally a wide multiplicity of equilibria that we refine through stochastic stability.
Paolo Pin, Leonardo Boncinelli
core  

Dual‐State Programmable Oxide Transistor for Time‐Based Cryptography

open access: yesAdvanced Materials, EarlyView.
A DUPOT enables independently tunable Vth and Isat depending on gate bias polarity, producing three‐dimensional dynamical behavior within a transfer characteristic. This behavior originates from charge trapping and oxygen‐ion migration in the HfO2 layer.
Huisu Noh   +9 more
wiley   +1 more source

Stochastic analysis of overlapping generations models under incomplete markets. [PDF]

open access: yesMath Financ Econ
Chen C   +4 more
europepmc   +1 more source

Controlled Synthesis of Tri‐ and Multi‐Doped Graphene

open access: yesAdvanced Materials Interfaces, EarlyView.
This review systematically evaluates synthesis routes for tri‐ and multi‐doped graphene, from hydrothermal and pyrolysis methods to flash Joule heating, critically assessing how each governs dopant incorporation, bonding configuration, and resulting electronic properties.
Maria Hasan   +4 more
wiley   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

open access: yesAdvanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source

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