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Susceptibility characterization of microprocessor and LSI technology
Microprocessors and Microsystems, 1988Abstract Microprocessor and digital LSI technology used for process control in heavy industrial plant is subject to interference from electromagnetic (EM) radiation in the vicinity of these sites. This paper considers the tests that are necessary to demonstrate with some level of confidence that such equipment will not malfunction in the EM ...
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The characterization of technological zinc cycles
Resources, Conservation and Recycling, 2003A comprehensive accounting of the anthropogenic mobilization of zinc must treat a series of life stages: mining and processing, fabrication, utilization, and end of life. Reservoirs in which zinc resides include the lithosphere, ore and ingot processing facilities, at least a dozen major uses, several intentional and default stockpiles, landfills, and ...
R.B Gordon +6 more
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P3GA: An Algorithm for Technology Characterization
Journal of Mechanical Design, 2015It is important for engineers to understand the capabilities and limitations of the technologies they consider for use in their systems. However, communicating this information can be a challenge. Mathematical characterizations of technical capabilities are of interest as a means to reduce ambiguity in communication and to increase opportunities to ...
Edgar Galvan, Richard J. Malak
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On the Characterization and Measure of Machine Cells in Group Technology
Operations Research, 1996Group technology plays an important role in the design of an automated manufacturing system. The ideal situation is to partition the machines into machine cells and the parts into part families so that each machine cell together with the part family for the cell is independent of the rest of the system.
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Characterization of outgassing for EUV technology
SPIE Proceedings, 2004Outgassing of photoresists needs to be minimized to avoid contamination of optics. A new challenge for EUV photoresists - that was not encountered for previous lithography technologies - is that exposures will occur in a vacuum environment. In order to design resists that meet the outgassing requirements for EUV lithography, current EUV photoresists ...
Vani Thirumala +8 more
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Active Nano-Characterization and Technology
Nanotechnology, 2004Recent strong demands to fabricate novel nanoscopic devices and functional materials have led to the development of new multi-functional tools for nanofabrication and nano-characterization with unconventional environments. Conventional analytical tools need to be totally updated to match the new technological trend of nanotechnology and nanoscience ...
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SiCOI Structures. Technology and Characterization
2002In this work, we present an alternative approach for the fabrication of SiCOI material based on the ion beam synthesis technique. In this process, β-SiC layers are synthesized by a multiple high dose C+ implantation designed to form a buried stoichiometric flat carbon profile.
Serre, C. +7 more
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Characterization of the Information Technology Industry
2020In this book, we present a case study of a Portuguese company of the information technologies industry that has traveled through an internationalization process and has implemented a management control system with a very interesting complexity level. Thus, this chapter will begin with the definition of the scope of the industry and the supply typology,
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