Results 161 to 170 of about 103,389 (181)

The application of 13C-labeled tetramethylammonium hydroxide (13C-TMAH) thermochemolysis to the study of fungal degradation of wood

Organic Geochemistry, 2000
This paper presents the results from an assessment of the application of a new molecular analytical procedure, 13 CTMAH thermochemolysis, to study the chemical modification of lignin by white-rot and brown-rot fungi. This technique diAers from other molecular chemolysis procedures (e.g.
T.R Filley, P.G Hatcher, W.C Shortle, R.T Praseuth   +3 more
openaire   +1 more source

Kinetic analysis of biological degradation for tetramethylammonium hydroxide (TMAH) in the anaerobic activated sludge system at ambient temperature

Biochemical Engineering Journal, 2016
Abstract With rapid development of thin-film transistor liquid crystal display industries, improvements of the wastewater treatments for spent developing fluid (Tetramethylammonium hydroxide (TMAH)) is essential. As an alternative to the conventional aerobic processes, an anaerobic process in ambient temperature composed of a suspended sludge reactor
Bing Liu, Kohei Yoshinaga, Jer-Horng Wu, Wei-Yu Chen, Mitsuharu Terashima, Rajeev Goel, Domenico Pangallo, Hidenari Yasui   +7 more
openaire   +1 more source

A study of the chemical breakdown of the anodic oxide formed on (100) oriented silicon in tetramethylammonium hydroxide (TMAH) solutions

Electrochimica Acta, 2003
An investigation was carried out into the chemical breakdown of the anodic oxides grown on p- and n-doped (100) orientated silicon in tetramethylammonium hydroxide (TMAH) solutions. The anodic oxides were grown by sweeping the potential anodic of the passivation potential (PP) and into the passive region.
Paul G Miney, Vincent J Cunnane
openaire   +1 more source

Influence of underlayer on development of chemically amplified photoresist film in tetramethylammonium hydroxide (TMAH) aqueous developer

Japanese Journal of Applied Physics
Abstract The interactions between the underlayer and photoresist significantly affect the dissolution behavior and patterns formed in the photoresist during development. Therefore, it is important to analyze the dissolution behavior of a photoresist with an underlayer.
Jiahao Wang, Takahiro Kozawa
openaire   +1 more source

Effects of influent organic load on TMAH (tetramethylammonium hydroxide) wastewater treatment by anaerobic process

Journal of Environmental Chemical Engineering, 2023
Juan Lv, Qi Ni, Jiaqi Dong, Changyuan Ou, Yiqing Cao, Jiong Gan, Fan Xiao   +6 more
openaire   +1 more source

97/02408 Characterization of peatified and coalified wood by tetramethylammonium hydroxide (TMAH) thermochemolysis

Fuel and Energy Abstracts, 1997
openaire   +1 more source

Decontamination of tetramethylammonium hydroxide (TMAH) splashes: promising results with Diphoterine®in vitro

Cutaneous and Ocular Toxicology, 2010
Laurence Mathieu, François Burgher, Alan H Hall   +2 more
exaly  

Influence of surface free energy of underlayer on the dissolution of resist film in tetramethylammonium hydroxide (TMAH) aqueous solution

International Conference on Extreme Ultraviolet Lithography 2023, 2023
Jiahao Wang, Yukiko Sasaki, Takahiro Kozawa   +2 more
openaire   +1 more source

Electron-impact (EI) mass spectra of 1,2-dimethoxybenzenes related to the pyrolysis products of guaiacyl lignin in the presence of tetramethylammonium hydroxide (TMAH)

Journal of Analytical and Applied Pyrolysis, 2002
Ken-Ichi Kuroda
exaly  

Tetramethylammonium hydroxide (TMAH) thermochemolysis of lignin: Formation of ()-5-formyl-2,3,3′,4′-tetramethoxystilbene and its origins

Journal of Analytical and Applied Pyrolysis, 2010
Koki Fujita, Tatsuya Ashitani
exaly