Results 181 to 190 of about 7,276 (219)
Some of the next articles are maybe not open access.
Biochemical Engineering Journal, 2016
Abstract With rapid development of thin-film transistor liquid crystal display industries, improvements of the wastewater treatments for spent developing fluid (Tetramethylammonium hydroxide (TMAH)) is essential. As an alternative to the conventional aerobic processes, an anaerobic process in ambient temperature composed of a suspended sludge reactor
Bing Liu +7 more
semanticscholar +2 more sources
Abstract With rapid development of thin-film transistor liquid crystal display industries, improvements of the wastewater treatments for spent developing fluid (Tetramethylammonium hydroxide (TMAH)) is essential. As an alternative to the conventional aerobic processes, an anaerobic process in ambient temperature composed of a suspended sludge reactor
Bing Liu +7 more
semanticscholar +2 more sources
Journal of Analytical and Applied Pyrolysis, 2023
Nakakuni Masatoshi +2 more
semanticscholar +2 more sources
Nakakuni Masatoshi +2 more
semanticscholar +2 more sources
Japanese Journal of Applied Physics, 2022
The dissolution (including the formation of a transient swelling layer) of a resist polymer is key to realizing ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified.
Yu Ito +4 more
semanticscholar +1 more source
The dissolution (including the formation of a transient swelling layer) of a resist polymer is key to realizing ultrafine patterning. However, the details of the dissolution of resist polymers remain unclarified.
Yu Ito +4 more
semanticscholar +1 more source
Japanese Journal of Applied Physics, 2023
Development (the dissolution of resist films in developer) is an important lithographic process. However, details of the dissolution of resist polymers remain unclarified.
Yuko Tsutsui Ito +5 more
semanticscholar +1 more source
Development (the dissolution of resist films in developer) is an important lithographic process. However, details of the dissolution of resist polymers remain unclarified.
Yuko Tsutsui Ito +5 more
semanticscholar +1 more source
Journal of Analytical and Applied Pyrolysis, 2001
C. Vane, G. Abbott, I. Head
semanticscholar +3 more sources
C. Vane, G. Abbott, I. Head
semanticscholar +3 more sources
Cutaneous and Ocular Toxicology, 2010
Tetramethylammonium hydroxide (TMAH), used in microelectronic industries and research and development, has both corrosive properties and systemic toxicity. Two fatal TMAH occupational exposure cases have been published. Studies comparing initial TMAH decontamination with Diphoterine versus tap water were performed: an in vitro pH titration study and an
Céline, Fosse +6 more
openaire +2 more sources
Tetramethylammonium hydroxide (TMAH), used in microelectronic industries and research and development, has both corrosive properties and systemic toxicity. Two fatal TMAH occupational exposure cases have been published. Studies comparing initial TMAH decontamination with Diphoterine versus tap water were performed: an in vitro pH titration study and an
Céline, Fosse +6 more
openaire +2 more sources
Journal of Analytical and Applied Pyrolysis, 2009
S. Mason, T. Filley, G. Abbott
semanticscholar +3 more sources
S. Mason, T. Filley, G. Abbott
semanticscholar +3 more sources
Materials Research Innovations, 2010
AbstractLyocell fibres were treated with tetramethylammonium hydroxide (TMAH) up to 1·5M, which was demonstrated to be more effective than LiOH, NaOH and KOH treatments at the same concentration in the sole interfibrillar swelling region. The porous structure of fibres was studied by inverse size exclusion chromatography to identify mean pore diameter,
H. B. Öztürk +3 more
openaire +1 more source
AbstractLyocell fibres were treated with tetramethylammonium hydroxide (TMAH) up to 1·5M, which was demonstrated to be more effective than LiOH, NaOH and KOH treatments at the same concentration in the sole interfibrillar swelling region. The porous structure of fibres was studied by inverse size exclusion chromatography to identify mean pore diameter,
H. B. Öztürk +3 more
openaire +1 more source
Japanese Journal of Applied Physics
Wet etching of (001) β-Ga2O3 was performed using a standard lithographic developer—an aqueous solution of 2.38 wt% tetramethylammonium hydroxide (TMAH)—at moderate temperatures of 25 °C and 40 °C.
Takayoshi Oshima
semanticscholar +1 more source
Wet etching of (001) β-Ga2O3 was performed using a standard lithographic developer—an aqueous solution of 2.38 wt% tetramethylammonium hydroxide (TMAH)—at moderate temperatures of 25 °C and 40 °C.
Takayoshi Oshima
semanticscholar +1 more source

