Results 31 to 40 of about 103,389 (181)
We demonstrated dual-surface modification of GaN/AlGaN/GaN high-electron mobility transistors using tetramethylammonium hydroxide (TMAH) and piranha solutions prior to gate metallization.
M. Siva Pratap Reddy +3 more
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Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX [PDF]
In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80°C is presented and analysed.
Smiljanić Milče M. +7 more
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Background Tetramethylammonium hydroxide (TMAH) is a quaternary ammonium compound that is both a base corrosive and a cholinergic agonist, and it is widely used in the photoelectric and semiconductor industries.
Chih-Kang Huang +6 more
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InGaN Laser Diodes with Etched Facets for Photonic Integrated Circuit Applications
The main objective of this work is to demonstrate and validate the feasibility of fabricating (Al, In) GaN laser diodes with etched facets. The facets are fabricated using a two-step dry and wet etching process: inductively coupled plasma—reactive ion ...
Krzysztof Gibasiewicz +6 more
doaj +1 more source
Nitrogen-containing wastewater is an important issue in optoelectronic and semiconductor industries. Wastewater containing nitrogen compounds such as ammonium, monoethanolamine (MEA), and tetramethylammonium hydroxide (TMAH) must be properly treated due ...
Da Tian Chang +3 more
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© 2022 Elsevier B.V.Semiconductor wastewater usually has a low level of dissolved oxygen and alcohol because ultra-pure water used in the process undergoes rigorous degassing and wafer development, respectively.
Kim, Tae-Kyoung +4 more
core +1 more source
The macromolecular composition of dinoflagellate cyst walls is poorly understood and is usually referred to as ‘sporopollenin-like’. We have carried out micro-Fourier transform infra red (micro-FTIR) analysis of chemically untreated sediment-derived and ...
Oltmanns, S. +23 more
core +1 more source
Tetramethylammonium hydroxide (TMAH) is a highly caustic organic base extensively utilized in semiconductor and display manufacturing processes, including photoresist development, silicon etching, and cleaning procedures.
Hyejin Kim, Haeri Lee
doaj +1 more source
High speed silicon wet anisotropic etching for applications in bulk micromachining: a review
Wet anisotropic etching is extensively employed in silicon bulk micromachining to fabricate microstructures for various applications in the field of microelectromechanical systems (MEMS).
Prem Pal +5 more
doaj +1 more source

