Results 31 to 40 of about 1,337 (176)

Enhanced Light Extraction of Flip-Chip Mini-LEDs with Prism-Structured Sidewall

open access: yesNanomaterials, 2019
Current solutions for improving the light extraction efficiency of flip-chip light-emitting diodes (LEDs) mainly focus on relieving the total internal reflection at sapphire/air interface, but such methods hardly affect the epilayer mode photons.
Bin Tang   +6 more
doaj   +1 more source

Dual-Surface Modification of AlGaN/GaN HEMTs Using TMAH and Piranha Solutions for Enhancing Current and 1/f-Noise Characteristics

open access: yesIEEE Journal of the Electron Devices Society, 2018
We demonstrated dual-surface modification of GaN/AlGaN/GaN high-electron mobility transistors using tetramethylammonium hydroxide (TMAH) and piranha solutions prior to gate metallization.
M. Siva Pratap Reddy   +3 more
doaj   +1 more source

Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX [PDF]

open access: yesHemijska Industrija, 2021
In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80°C is presented and analysed.
Smiljanić Milče M.   +7 more
doaj   +1 more source

InGaN Laser Diodes with Etched Facets for Photonic Integrated Circuit Applications

open access: yesMicromachines, 2023
The main objective of this work is to demonstrate and validate the feasibility of fabricating (Al, In) GaN laser diodes with etched facets. The facets are fabricated using a two-step dry and wet etching process: inductively coupled plasma—reactive ion ...
Krzysztof Gibasiewicz   +6 more
doaj   +1 more source

Effect of tetramethylammonium hydroxide/isopropyl alcohol wet etching on geometry and surface roughness of silicon nanowires fabricated by AFM lithography

open access: yesBeilstein Journal of Nanotechnology, 2016
The optimization of etchant parameters in wet etching plays an important role in the fabrication of semiconductor devices. Wet etching of tetramethylammonium hydroxide (TMAH)/isopropyl alcohol (IPA) on silicon nanowires fabricated by AFM lithography is ...
Siti Noorhaniah Yusoh   +1 more
doaj   +1 more source

Presentations of tetramethylammonium hydroxide dermal exposure and the valuable potential of diphoterine solution in decontamination: a retrospective observational study

open access: yesBMC Pharmacology and Toxicology, 2020
Background Tetramethylammonium hydroxide (TMAH) is a quaternary ammonium compound that is both a base corrosive and a cholinergic agonist, and it is widely used in the photoelectric and semiconductor industries.
Chih-Kang Huang   +6 more
doaj   +1 more source

Assessment of an MnCe-GAC Treatment Process for Tetramethylammonium-Contaminated Wastewater from Optoelectronic Industries

open access: yesApplied Sciences, 2019
Nitrogen-containing wastewater is an important issue in optoelectronic and semiconductor industries. Wastewater containing nitrogen compounds such as ammonium, monoethanolamine (MEA), and tetramethylammonium hydroxide (TMAH) must be properly treated due ...
Da Tian Chang   +3 more
doaj   +1 more source

Murchison Meteorite Analysis Using Tetramethylammonium Hydroxide (TMAH) Thermochemolysis Under Simulated Sample Analysis at Mars (SAM) Pyrolysis‐Gas Chromatography‐Mass Spectrometry Conditions [PDF]

open access: hybrid, 2023
Angel Mojarro   +9 more
openalex   +2 more sources

Foraminifera Iodine to Calcium Ratios: Approach and Cleaning

open access: yesGeochemistry, Geophysics, Geosystems, 2021
Planktic and benthic foraminiferal iodine (I) to calcium (Ca) molar ratios have been proposed as an exciting new proxy to assess subsurface and bottom water oxygenation in the past.
Helge Winkelbauer   +10 more
doaj   +1 more source

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