Results 31 to 40 of about 103,389 (181)

Dual-Surface Modification of AlGaN/GaN HEMTs Using TMAH and Piranha Solutions for Enhancing Current and 1/f-Noise Characteristics

open access: yesIEEE Journal of the Electron Devices Society, 2018
We demonstrated dual-surface modification of GaN/AlGaN/GaN high-electron mobility transistors using tetramethylammonium hydroxide (TMAH) and piranha solutions prior to gate metallization.
M. Siva Pratap Reddy   +3 more
doaj   +1 more source

Controllable arrangement of integrated obstacles in silicon microchannels etched in 25 wt.% TMAX [PDF]

open access: yesHemijska Industrija, 2021
In this paper, fabrication of silicon microchannels with integrated obstacles by using 25 wt.% tetramethylammonium hydroxide (TMAH) aqueous solution at the temperature of 80°C is presented and analysed.
Smiljanić Milče M.   +7 more
doaj   +1 more source

Recommendation on Target Level of Tetramethylammonium Hydroxide (TMAH) in Wastewater Management toward Protection of Aquatic Organisms

open access: yesJournal of Japan Society on Water Environment, 2019
Marika ADACHI   +5 more
exaly   +3 more sources

Presentations of tetramethylammonium hydroxide dermal exposure and the valuable potential of diphoterine solution in decontamination: a retrospective observational study

open access: yesBMC Pharmacology and Toxicology, 2020
Background Tetramethylammonium hydroxide (TMAH) is a quaternary ammonium compound that is both a base corrosive and a cholinergic agonist, and it is widely used in the photoelectric and semiconductor industries.
Chih-Kang Huang   +6 more
doaj   +1 more source

InGaN Laser Diodes with Etched Facets for Photonic Integrated Circuit Applications

open access: yesMicromachines, 2023
The main objective of this work is to demonstrate and validate the feasibility of fabricating (Al, In) GaN laser diodes with etched facets. The facets are fabricated using a two-step dry and wet etching process: inductively coupled plasma—reactive ion ...
Krzysztof Gibasiewicz   +6 more
doaj   +1 more source

Assessment of an MnCe-GAC Treatment Process for Tetramethylammonium-Contaminated Wastewater from Optoelectronic Industries

open access: yesApplied Sciences, 2019
Nitrogen-containing wastewater is an important issue in optoelectronic and semiconductor industries. Wastewater containing nitrogen compounds such as ammonium, monoethanolamine (MEA), and tetramethylammonium hydroxide (TMAH) must be properly treated due ...
Da Tian Chang   +3 more
doaj   +1 more source

Degradation of tetramethylammonium hydroxide (TMAH) during UV-LED/H2O2 reaction: Degassing effect, radical contribution, and degradation mechanism

open access: yes, 2022
© 2022 Elsevier B.V.Semiconductor wastewater usually has a low level of dissolved oxygen and alcohol because ultra-pure water used in the process undergoes rigorous degassing and wafer development, respectively.
Kim, Tae-Kyoung   +4 more
core   +1 more source

Infra red spectroscopy, flash pyrolysis, thermally assisted hydrolysis and methylation (THM) in the presence of tetramethylammonium hydroxide (TMAH) of cultured and sediment-derived Lingulodinium polyedrum (Dinoflagellata) cyst walls

open access: yes, 2012
The macromolecular composition of dinoflagellate cyst walls is poorly understood and is usually referred to as ‘sporopollenin-like’. We have carried out micro-Fourier transform infra red (micro-FTIR) analysis of chemically untreated sediment-derived and ...
Oltmanns, S.   +23 more
core   +1 more source

Development of a highly conjugated chromophore for precise concentration determination of N(CH3)4OH and N(C4H9)4OH

open access: yesResults in Chemistry
Tetramethylammonium hydroxide (TMAH) is a highly caustic organic base extensively utilized in semiconductor and display manufacturing processes, including photoresist development, silicon etching, and cleaning procedures.
Hyejin Kim, Haeri Lee
doaj   +1 more source

High speed silicon wet anisotropic etching for applications in bulk micromachining: a review

open access: yesMicro and Nano Systems Letters, 2021
Wet anisotropic etching is extensively employed in silicon bulk micromachining to fabricate microstructures for various applications in the field of microelectromechanical systems (MEMS).
Prem Pal   +5 more
doaj   +1 more source

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