Results 61 to 70 of about 1,337 (176)

Experimental methods in chemical engineering: Atomic absorption spectrometry—AAS

open access: yesThe Canadian Journal of Chemical Engineering, Volume 104, Issue 5, Page 2206-2224, May 2026.
Abstract Elements absorb electromagnetic radiation (light) of a specific wavelength in proportion to the number of atoms in its path. As the atoms absorb this light energy, electrons rise from the ground state to an excited state. In atomic absorption spectrometry (AAS), high temperatures produce clouds of atoms from the sample (atomization) and ...
Emily Cintia Tossi de A. Costa   +4 more
wiley   +1 more source

Aspect Ratio‐Controlled Chiral Nanostructures for Dual‐Mode Breast Cancer Theranostics

open access: yesRare Metals, Volume 45, Issue 5, May 2026.
ABSTRACT Chiral CdSe/CdS quantum dots (QDs) have emerged as promising platforms for precise cancer diagnosis and therapy due to their unique optical properties and biological interactions. In this study, we systematically investigated the role of aspect ratio (AR) modulation in ultrathin‐shelled chiral CdSe/CdS dot‐in‐rods (DRs) on their performance in
Linxuan Wu   +9 more
wiley   +1 more source

COMPARISON OF IODINE DETERMINATION IN SPINACH USING 2% CH3COOH AND TMAH

open access: yesActa Scientiarum Polonorum: Hortorum Cultus, 2011
Tetramethylammonium hydroxide (TMAH) is the compound most commonly applied for iodine determination in environmental samples but, at the same time, is very harmful for human health when used as an analytical reagent.
Sylwester Smoleń   +3 more
doaj  

Laser‐Enabled Nanopinholes for Silicon Solar Cells with Polycrystalline Si/SiOx Passivating Contacts

open access: yesSolar RRL, Volume 10, Issue 8, 27 April 2026.
Conductive nanoscale pinholes are created by selective heating of pyramid tips on randomly textured silicon via pulsed laser irradiation. Due to heat concentration at the pyramid tips, the dielectric passivating layer is selectively opened at the pyramid tips.
Dirk W. Steyn   +12 more
wiley   +1 more source

Tin‐Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity

open access: yesAdvanced Functional Materials, Volume 36, Issue 27, 2 April 2026.
Fluoroalkyl‐functionalized tin–oxo nanoclusters (N‐TOC6) enable robust pattern formation through ligand crosslinking under EUV exposure without thermal processing. Sn–F coordination mitigates the Lewis acidity of Sn centers, suppressing reactions with airborne molecules and improving post‐exposure pattern stability.
Yejin Ku   +18 more
wiley   +1 more source

Solution‐Processed Spin‐Polarized Light‐Emitting Diodes of Colloidal Quantum Wells and Magnetic Nanoparticles

open access: yesAdvanced Optical Materials, Volume 14, Issue 12, 25 March 2026.
All‐solution‐processed spin‐LEDs based on colloidal Fe3O4 nanoparticles and CdSe/CdZnS core/shell CQWs that allows for polarization modulation of electroluminescence are fabricated. With these devices, electrical injection of spin‐polarized carriers from the Fe3O4 nanoparticle layer into the CdSe/CdZnS CQWs is demonstrated, realizing circularly ...
Savas Delikanli   +14 more
wiley   +1 more source

Etching of Uncompensated Convex Corners with Sides along <n10> and <100> in 25 wt% TMAH at 80 °C

open access: yesMicromachines, 2020
This paper presents etching of convex corners with sides along <n10> and <100> crystallographic directions in a 25 wt% tetramethylammonium hydroxide (TMAH) water solution at 80 °C.
Milče M. Smiljanić   +4 more
doaj   +1 more source

Structural characterization of bio- and geo-macromolecules by off-line thermochemolysis with tetramethylammonium hydroxide

open access: yesJournal of Chromatography A, 1998
A new analytical procedure, tetramethylammonium hydroxide thermochemolysis, was used to structurally characterize a variety of bio-and geo-polymers. The technique cleaves esters and some ethers in macromolecular organic matter, yielding low-molecular-mass monomers such as methyl esters of carboxylic acids and methyl ethers of alcohols that are amenable
Río Andrade, José Carlos del   +5 more
openaire   +2 more sources

Enhancing Grayscale E‐Beam Lithography: Thermal Treatment of Novolak‐Based Resist for 3D Nanostructures

open access: yesAdvanced Materials Interfaces, Volume 13, Issue 4, 17 February 2026.
Surface roughness and chemistry of novolak‐based grayscale resists are dependent on both exposure dose and post‐exposure thermal treatment. The observed trends align with the viscoelastic phase separation model and underscore the need to consider both thermodynamic and kinetic factors in resist processing. By tailoring thermal treatment, it is possible
Rahul Singh   +4 more
wiley   +1 more source

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