Results 251 to 260 of about 108,023 (304)
Some of the next articles are maybe not open access.
2005
Abstract A liquid can be thought of as incompressible; at a molecular level it is because the molecules are so close together that very little further approximation of them is possible. If these molecules are given sufficient energy in the form of heat, they acquire more kinetic energy as shown by an increase in temperature.
Patrick Magee, Mark Tooley
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Abstract A liquid can be thought of as incompressible; at a molecular level it is because the molecules are so close together that very little further approximation of them is possible. If these molecules are given sufficient energy in the form of heat, they acquire more kinetic energy as shown by an increase in temperature.
Patrick Magee, Mark Tooley
openaire +1 more source
The ADU Vaporizing Unit: A New Vaporizer
Anesthesia & Analgesia, 2001We determined the performance of the vaporizer of the ADU machine (Anesthesia Delivery Unit; Datex-Ohmeda, Helsinki, Finland). The effects of carrier gas composition (oxygen, oxygen/N(2)O mixture, and air) and fresh gas flow (0.2 to 10 L/min) on vaporizer performance were examined with variable concentrations of isoflurane, sevoflurane, and desflurane ...
J F, Hendrickx +5 more
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Vapor Pressure and Solvent Vapor Hazards
AIHAJ, 1984This paper discusses applications of vapor pressure to industrial hygiene. Vapor pressure is the quantitative term characterizing solvent volatility; it is also equivalent to the concentration of solvent vapor at the liquid surface. The ratio between this concentration at the source and the acceptable concentration at the breathing zone is an intrinsic
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2007
Chemical vapor deposition reactors provide a controlled environment for the reactants activation, proper distribution, and delivery; in addition, the environment on and around the substrates. Chemical vapor deposition Al integrated W/physical vapor deposition Al reflow for dynamic random access memory application also at the start of implementing into ...
Li-Qun Xia, Mei Chang
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Chemical vapor deposition reactors provide a controlled environment for the reactants activation, proper distribution, and delivery; in addition, the environment on and around the substrates. Chemical vapor deposition Al integrated W/physical vapor deposition Al reflow for dynamic random access memory application also at the start of implementing into ...
Li-Qun Xia, Mei Chang
openaire +1 more source
International Journal of Machine Tools and Manufacture, 2021
Jie Yin, Huiliang Wei, Haihong Zhu
exaly
Jie Yin, Huiliang Wei, Haihong Zhu
exaly

