Results 131 to 140 of about 490,111 (287)

Parity‐Dependent THz Harmonic Generation in Electrically Pumped Micro‐Lasers Exploiting Topological Insulator–Metamaterial Gratings

Advanced Materials, EarlyView.
Topological insulator–metamaterials integrated with electrically driven terahertz quantum cascade lasers enable parity‐dependent harmonic generation. Bulk‐dominated Bi2Se3 favors third‐harmonic emission at 9.96 THz, whereas topological‐surface‐state‐dominated Bi2Se3, Bi2Te3, and (Bi,Sb)2Te3 generate strong second harmonics near 6.5 THz.
Alessandra Di Gaspare, Craig S. Knox, Ahmet Yagmur, Sara Ghayeb Zamharir, Lianhe Li, Satoshi Sasaki, A. Giles Davies, Edmund H. Linfield, Joshua R. Freeman, Miriam S. Vitiello   +9 more
wiley   +1 more source

A Study on the Sub-5 nm Nano-Step Height Reference Materials Fabricated by Atomic Layer Deposition Combined with Wet Etching. [PDF]

Micromachines (Basel), 2022
Wang C, Li L, Jing W, Zhang Y, Wang S, Lin Q, Xian D, Mao Q, Zhang Y, Duan D, Liu M, Jiang Z.   +11 more
europepmc   +1 more source

Soft and Transient Bioelectronics Enabled by Polymer‐Free Ti3C2Tx MXene Hydrogels

Advanced Materials, EarlyView.
We present Ti3C2Tx MXene hydrogel (MXgel) bioelectronics, a soft, flexible, and fully transient platform for high‐fidelity neural recording and stimulation. MXgel bioelectronics exhibit exceptional electrical conductivities, low electrochemical impedances, and high charge injection capacities.
Raghav Garg, Franco A. Laimo, Stefano Ippolito, Prastuti Upadhyay, Spencer R. Averbeck, Dimitris Boufidis, Charles‐Antoine Assenmacher, Dayo O. Adewole, Sai Panigrahy, Bita Soltan Mohammadlou, Lucy Plant, Yuan Zhang, Andrew G. Richardson, Yury Gogotsi, D. Kacy Cullen, Flavia Vitale   +15 more
wiley   +1 more source

Tamper‐Responsive Physical Unclonable Functions via Graphene‐Interlayered Block Copolymer Random Structures

Advanced Materials, EarlyView.
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo, Dae Hui Park, Jeong‐Ho Jang, Woo Seok Tack, Jin Man Kim, Hak Ki Yu, Hyeong Min Jin, Jang Hwan Kim   +7 more
wiley   +1 more source

Indium-Based Micro-Bump Array Fabrication Technology with Added Pre-Reflow Wet Etching and Annealing. [PDF]

Materials (Basel), 2021
Kozłowski P, Czuba K, Chmielewski K, Ratajczak J, Branas J, Korczyc A, Regiński K, Jasik A.   +7 more
europepmc   +1 more source

Plasmon‐Enhanced Second‐Harmonic Generation in Atomically Thin Crystalline Silver Nanostructures

Advanced Materials, EarlyView.
Atomically thin crystalline silver films combine vertical quantum confinement with lateral plasmonic field enhancement to boost second‐harmonic generation. Nanoribbon and nanotriangle arrays enable geometry‐tunable infrared plasmon resonances, producing strong SHG from deeply subwavelength metallic volumes compatible with silicon‐based nanophotonics ...
Saad Abdullah, Philipp K. Jenke, Andrew P. Weber, Álvaro Rodríguez Echarri, Vahagn Mkhitaryan, Fadil Iyikanat, Frederik Schiller, Philip Walther, J. Enrique Ortega, Lee A. Rozema, F. Javier García de Abajo   +10 more
wiley   +1 more source

Ultra-Narrow Metallic Nano-Trenches Realized by Wet Etching and Critical Point Drying. [PDF]

Nanomaterials (Basel), 2021
Jeong J, Yang H, Park S, Park YD, Kim DS.   +4 more
europepmc   +1 more source

Low Resistance Interphase Formation at the PEO‐LiTFSI|LGPS Interface in Lithium Solid‐State Batteries

Advanced Materials Interfaces, EarlyView.
Interfacial charge transfer and low‐resistance interphase formation between PEO‐based polymer and Li10GeP2S12 solid electrolytes are investigated using multi‐electrode impedance spectroscopy and advanced analytical techniques such as XPS and ToF‐SIMS.
Ujjawal Sigar, Timo Weintraut, Sebastian L. Benz, Semih Engün, Sascha Kremer, Anja Henss, Felix H. Richter   +6 more
wiley   +1 more source

Investigation on Ge_0.8Si_0.2-Selective Atomic Layer Wet-Etching of Ge for Vertical Gate-All-Around Nanodevice. [PDF]

Nanomaterials (Basel), 2021
Xie L, Zhu H, Zhang Y, Ai X, Li J, Wang G, Du A, Kong Z, Wang Q, Lu S, Lu S, Li C, Li Y, Huang W, Radamson HH.   +14 more
europepmc   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

Advanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source