Results 141 to 150 of about 490,111 (287)

Band Alignment of Grafted Si/Ge0.89Sn0.11 Heterojunction Determined by X‐Ray Photoelectron Spectroscopy

Advanced Materials Interfaces, EarlyView.
ABSTRACT We investigate the band alignment of a monocrystalline grafted p‐type Si/Ge0.89Sn0.11 heterostructure using X‐ray photoelectron spectroscopy (XPS). The bandgap of the Ge0.89Sn0.11 epilayer of 0.50 eV was first determined and cross‐verified using photoluminescence spectroscopy, infrared transmission, and theoretical calculation.
Yang Liu, Yiran Li, Tsung‐Han Tsai, Sudip Acharya, Yi Lu, Jie Zhou, Samuel A. Haessly, Shui‐Qing Yu, Nanditha M. Dissanayake, Edward K. Huang, Jiarui Gong, Zhenqiang Ma   +11 more
wiley   +1 more source

Application of Wet Etching. Wet Etching-Theory and Application.

Journal of the Surface Finishing Society of Japan, 1998
openaire   +2 more sources

Ionic Liquid (IL) Compatibilization of Macropore‐Infused Nanocomposite Emulsion Thermosets (MINETs) for Structural Ion Transport

Advanced Materials Interfaces, EarlyView.
Macropore‐infused nanocomposite emulsion thermosets (MINETs) offer tunable multifunctionality due to their incorporation of structural resin, functional nanoparticles, and working fluid stabilized by surfactant. Here we show that if ionic liquid working fluids are introduced, structural capacitive (conductive particles) or separator (insulating ...
Bryan Llumiquinga, Iris You, Nare Cho, Madhuri Deb, Jordan C. Pierce, Kevin M. Miller, Jonathan P. Singer   +6 more
wiley   +1 more source

Unveiling the morphology of buried In(Ga)As nanostructures by selective wet chemical etching: From quantum dots to quantum rings

, 2007
The three-dimensional morphology of In(Ga)As nanostructures embedded in a GaAs matrix is investigated by combining atomic force microscopy and removal of the GaAs cap layer by selective wet etching.
Kiravittaya, S (Kiravittaya, Suwit), Schmidt, OG (Schmidt, Oliver G.), Wang, LJ (Wang, Lijuan), Ding, F, Max Planck Inst Festkorperforsch, Heisenbergerstr 1, D-70569 Stuttgart, Germany. 电子邮箱地址: f.ding@fkf.mpg.de, Ding, F (Ding, Fei), Muller, E (Mueller, Elisabeth), Rastelli, A (Rastelli, Armando)   +6 more
core  

O₂ plasma coupled wet-assisted etching process for two-dimensional material molybdenum disulfide transistors

四川大学学报. 自然科学版
Dry etching—realizing nanoscale pattern transfer through the directional bombardment of ions and reactive radicals—serves as the critical scaling engine for two-dimensional （2D） semiconductors to transcend Moore’s law and define atom-thin channels and ...
HUANG Kai, LU Ding, LUO Guoling, TIAN Hongjun, ZHOU Dianli, HAO Xin, LU Xin, LIU Jinxiu, TAN Chao, WANG Zegao   +9 more
doaj  

Development of numerically controlled local wet etching

Science and Technology of Advanced Materials, 2007
Numerically controlled local wet etching (NC-LWE) has been developed as a novel noncontact subaperture deterministic figuring method for fabricating ultraprecision optics or for finishing functional materials. In this method, a localized wet etching area
Kazuya Yamamura
doaj  

Interface Engineering of Porous Transport Layer‐Catalyst Layer in Proton Exchange Membrane Water Electrolyzers: A Comprehensive Review

Advanced Materials Interfaces, EarlyView.
The PTL–CL interface plays a decisive role in PEMWE performance by governing electron conduction, water supply, oxygen removal, catalyst utilization, and interfacial stability. This review summarizes interface‐related resistance sources, characterization methods, and engineering strategies, highlighting rational PTL–CL interface design for low‐cost ...
Aobo Wan, Zhengkai Tu
wiley   +1 more source

Large‐Scale and Cost‐Effective Fabrication of Ultra‐Thin, Biodegradable Microelectrode Arrays and Pressure Sensors Using Laser Micromachining

Advanced Materials Technologies, EarlyView.
A mask‐free and cost‐effective UV‐pico‐second laser‐based microfabrication method is proposed to fabricate large‐area biodegradable microelectrode arrays and pressure sensors. These devices demonstrate low impedance, good conformability, excellent biocompatibility, and rapid degradation, providing a new route for next‐generation transient electronics ...
Bhavani Prasad Yalagala, Asfand Tanwear, María Cerezo‐Sánchez, Hossein Parvizi, Morteza Amjadi, Hadi Heidari   +5 more
wiley   +1 more source

Photoelectrochemical Wet Etching of Gallium Nitride

, 1999
In this work, the technique of photoelectrochemical wet etching using KOH solutions has been developed for n-type GaN materials. Customized hardware and software have been assembled to carry out the etching. The etching characteristics were characterized
Youtsey, Christopher Thomas
core  

A Scalable Double-Sided Wet Etching Strategy for Large-Area Mushroom-Shaped Bionic Adhesives. [PDF]

Adv Sci (Weinh)
Ji K, Xu X, Chen J, Chen W, Zhu X, Ma H, Jiang X, Linghu C, Dai Z.   +8 more
europepmc   +1 more source