一种运用V形沟槽的硅基砷化镓材料的制备方法,包括以下步骤：步骤1：在硅衬底1上生长二氧化硅层；步骤2：采用传统光刻和RIE方法在二氧化硅层上沿着硅衬底的<110>方向刻蚀出沟槽；步骤3：采用KOH湿法刻蚀在沟槽的硅衬底上形成V形沟槽；步骤4：分别用piranha、SC2、HF和去离子水,清洗沟槽底部衬底的V形沟槽；步骤5：采用低压MOCVD的方法,先在沟槽内生长GaAs缓冲层,然后在沟槽内的GaAs缓冲层上生长GaAs顶层；步骤6：采用化学机械抛光的方法 ...
周旭亮 +4 more
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