Results 71 to 80 of about 206,982 (202)
Metal-oxide-semiconductor field-effect transistors (MOSFET's) using atomic-layer-deposited (ALD) Al$_2$O$_3$ as the gate dielectric are fabricated on the Si/Si$_{1-x}$Ge$_x$ heterostructures.
Lai, K. +6 more
core +1 more source
In situ synchrotron based x-ray techniques as monitoring tools for atomic layer deposition [PDF]
A
Christophe Detavernier +7 more
core +2 more sources
Atomic layer deposition of aluminum phosphate based on the plasma polymerization of trimethyl phosphate [PDF]
Aluminum phosphate thin films were deposited by plasma-assisted atomic layer deposition (ALD) using a sequence of trimethyl phosphate (TMP, Me3PO4) plasma, O-2 plasma, and trimethylaluminum (TMA, Me3Al) exposures.
Detavernier, Christophe +3 more
core +1 more source
Workshop ALD FUNdamentals : hot topics in ALD
Breng 101 onderzoekers, promovendi en specialisten uit de industrie met praktische kennis van atoomlaagdepositie (ALD) bij elkaar en stimuleer de discussie over de belangrijkste vragen waar iedereen mee worstelt. Dan gaan deze specialisten met nog meer vragen naar huis en hebben ze inspiratie opgedaan voor het schrijven van nieuwe onderzoeksvoorstellen
Biemans, C., Kessels, W.M.M.
openaire +1 more source
Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD
Abstract not Available.
Potts, SE +3 more
openaire +4 more sources
The development of rodent models that accurately reflect the pathogenesis of alcoholic liver disease (ALD) in humans is crucial for evaluating the nutritional intervention of food bioactive ingredients in ALD.
Xiaoting Yu +4 more
doaj +1 more source
Solvent free method for intense vaporization of solid molecular and inorganic compounds [PDF]
New tools have been developed for vaporization of solid precursors to meet the demands of high feed rate for CVD, ALD and other deposition ...
Bonnafous, Samuel +4 more
core
Atomic layer deposition (ALD) enables the conformal coating of porous materials, making the technique suitable for pore size tuning at the atomic level, e.g., for applications in catalysis, gas separation and sensing.
Bals, Sara +8 more
core +1 more source
Wafer-scale nanofabrication of sub-5 nm gaps in plasmonic metasurfaces
In the rapidly evolving field of plasmonic metasurfaces, achieving homogeneous, reliable, and reproducible fabrication of sub-5 nm dielectric nanogaps is a significant challenge.
Gour Jeetendra +9 more
doaj +1 more source
Electronic applications of carbon nanotubes (CNTs) require the deposition of dielectric films on the tubes while conserving their excellent electronic properties.
Friedrich, J. +3 more
core +1 more source

