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2001 6th International Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat. No.01EX443), 2002
The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
null Shi-Qing Wang +5 more
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The current status of ALD technology will be reviewed. In addition, engineered nanolaminate or alloy films of both dielectric and metal materials will be demonstrated and their applications discussed.
null Shi-Qing Wang +5 more
openaire +2 more sources
2017
Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
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Over the course of this semester understanding of the theory and application of Atomic Layer Deposition [ALD] was pursued, all in preparation for further research focusing on the charge carrier type, density, and mobility in ultrathin film ZnO. At the beginning of the semester a wide array of scientific articles was read in order to build up a basic ...
Pannock, Daniel, Banerjee, Parag
openaire +2 more sources
Novel materials by atomic layer deposition and molecular layer deposition
MRS Bulletin, 2011Abstract
Markku Leskelä +2 more
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Review of atomic layer deposition process, application and modeling tools
Materials Today: Proceedings, 2022Kingsley Ukoba +2 more
exaly
Atomic layer deposition method and atomic layer deposition device
2022KAMEDA NAOTO +2 more
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