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Atomic layer deposition (ALD) of palladium: from processes to applications
Critical Reviews in Solid State and Materials SciencesClément Lausecker +2 more
exaly
Electrical properties of atomic layer deposited (ALD) TiO2 films
2006Saarilahti, Jaakko +2 more
openaire +1 more source
Spatial Atomic Layer Deposition: a route towards further industrialization of ALD
2020openaire +1 more source
Precursors for ALD processes, In: Atomic Layer Deposition of Nanostructured Materials
2012openaire +2 more sources

