Results 121 to 130 of about 18,025 (163)

High-selectivity damascene chemical mechanical polishing

Thin Solid Films, 2006
In this study, multi-step chemical mechanical polishing (CMP) with different copper removal rates and polishing pads is used to eliminate topography efficiently and to reduce micro-scratches on copper films. In colloidal-silica-based slurry, the polishing behaviors of copper, tantalum and silicon dioxide are found to relate to that kind of alkaline ...
Shao-Yu Chiu, Ying-Lang Wang, Chuan-Pu Liu, Shih-Chieh Chang, Gwo-Jen Hwang, Ming-Shiann Feng, Chia-Fu Chen   +6 more
openaire   +1 more source

Chemical Mechanical Polishing of Gallium Nitride

Electrochemical and Solid-State Letters, 2002
Chemical mechanical polishing of gallium nitride with collodial silica has been demonstrated. Removal rates and ultimate surface roughnesses have been found to depend on sample polarity (either A or B faced) as well as the pH of the polishing fluid and the initial surface morphology.
P. R. Tavernier, T. Margalith, L. A. Coldren, S. P. DenBaars, D. R. Clarke   +4 more
openaire   +1 more source

Chemical Mechanical Polishing: Threshold Pressure and Mechanism

Electrochemical and Solid-State Letters, 1999
The material polishing or removal mechanism has been studied for chemical mechanical polishing (CMP) as used for integrated circuit fabrication.There can exist a threshold pressure in the CMP process due to the tribological interaction among abrasive particles, the polished wafer surface, and the polishing pad. The CMP material removed is negligible if
openaire   +1 more source

Integrative oncology: Addressing the global challenges of cancer prevention and treatment

Ca-A Cancer Journal for Clinicians, 2022
Jun J Mao,, Msce, Lorenzo Cohen, Karen M Mustian   +2 more
exaly  

Chemical Mechanical Polishing (CMP)

2013
Steven Danyluk, Sum Huan Ng
openaire   +1 more source

Biomaterials applications of chemical mechanical polishing

2012
Due to copyright restrictions, the access to the full text of this article is only available via subscription.
Başım, Gül Bahar, Özdemir, Zeynep, Mutlu, Ö.   +2 more
openaire   +1 more source

Chemical Mechanical Polishing of Tantalum

Journal of The Electrochemical Society, 2007
Jian Zhang, Shoutian Li, Phillip W. Carter   +2 more
openaire   +1 more source

Chemical-mechanical polishing technique

Metal Finishing, 1996
openaire   +1 more source

Obesity and adverse breast cancer risk and outcome: Mechanistic insights and strategies for intervention

Ca-A Cancer Journal for Clinicians, 2017
Cynthia Morata-Tarifa, Joyce M Slingerland   +1 more
exaly  

Multidisciplinary standards of care and recent progress in pancreatic ductal adenocarcinoma

Ca-A Cancer Journal for Clinicians, 2020
Aaron J Grossberg, William L Hwang, Anirban Maitra   +2 more
exaly