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2007
Chemical vapor deposition reactors provide a controlled environment for the reactants activation, proper distribution, and delivery; in addition, the environment on and around the substrates. Chemical vapor deposition Al integrated W/physical vapor deposition Al reflow for dynamic random access memory application also at the start of implementing into ...
Li-Qun Xia, Mei Chang
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Chemical vapor deposition reactors provide a controlled environment for the reactants activation, proper distribution, and delivery; in addition, the environment on and around the substrates. Chemical vapor deposition Al integrated W/physical vapor deposition Al reflow for dynamic random access memory application also at the start of implementing into ...
Li-Qun Xia, Mei Chang
openaire +1 more source
2020
The coating of various types of materials, i.e., metals, ceramics, polymers, and composites, with ceramic layers and films is one of the key technologies employed for prolonging the lifetime of infrastructural materials by protecting them from harsh environments. This process also enhances properties and adds multi-functionalities to materials. Thermal
Hirokazu Katsui, Takashi Goto
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The coating of various types of materials, i.e., metals, ceramics, polymers, and composites, with ceramic layers and films is one of the key technologies employed for prolonging the lifetime of infrastructural materials by protecting them from harsh environments. This process also enhances properties and adds multi-functionalities to materials. Thermal
Hirokazu Katsui, Takashi Goto
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Photocatalytic TiO2 deposition by chemical vapor deposition
Journal of Hazardous Materials, 2000Dip-coating, spray-coating or spin-coating methods for crystalline thin film deposition require post-annealing process at high temperature. Since chemical vapor deposition (CVD) process is capable of depositing high-quality thin films without post-annealing process for crystallization, CVD method was employed for the deposition of TiO(2) films on ...
D, Byun +4 more
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Growth Dynamics of Chemical Vapor Deposition
Physical Review Letters, 1989The morphological growth dynamics of chemical vapor deposition are studied with a model that takes account of both diffusive transport in the bulk and the kinetics of surface reactions. For the case of a fixed flux of reactant species far from the surface, we study numerically the crossover from diffusion-limited growth to surface kinetic-limited ...
, Bales, , Redfield, , Zangwill
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Chemical vapor deposition of graphene films
Nanotechnology, 2010Graphene films were grown on nickel films and foils using chemical vapor deposition. To date, similar growth has been reported at around 1000 degrees C using methane or ethylene as source gases. However, by using acetylene, we have achieved growth of graphene films between 650 and 700 degrees C.
G, Nandamuri, S, Roumimov, R, Solanki
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Electric Fields and Chemical Vapor Deposition
ECS Meeting Abstracts, 2010Abstract not Available.
Michael Warwick +4 more
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