Results 61 to 70 of about 104,686 (214)

Plasma Enhanced Chemical Vapor Deposition of Poly(2,2,3,4,4,4‐hexafluorobutyl acrylate) Thin Films

, 2015
The synthesis of poly(2,2,3,4,4,4-hexafluorobutyl acrylate) (PHFBA) thin films using plasma enhanced chemical vapor deposition (PECVD) method is reported. PHFBA is a non-toxic and low surface energy polymer containing a-CF3 end group, which makes PHFBA a
Ezgi Yenice, Yenice, Ezgi, Karaman, Mustafa, Mustafa Karaman   +3 more
core   +1 more source

A Review: Preparation, Performance, and Applications of Silicon Oxynitride Film

Micromachines, 2019
Silicon oxynitride (SiNxOy) is a highly promising functional material for its luminescence performance and tunable refractive index, which has wide applications in optical devices, non-volatile memory, barrier layer, and scratch-resistant coatings.
Yue Shi, Liang He, Fangcao Guang, Luhai Li, Zhiqing Xin, Ruping Liu   +5 more
doaj   +1 more source

Deposition of silicon nitride films using chemical vapor deposition for photovoltaic applications

Results in Physics, 2016
Silicon nitride is a versatile material since many decades due to its compatibility with conventional fabrication technology. Other than its potential applications in microelectronics, this material has been regarded as an antireflection coating in solar
K. Jhansirani, R.S. Dubey, M.A. More, Shyam Singh   +3 more
doaj   +1 more source

Laser Induced Chemical Vapor Deposition [PDF]

Europhysics News, 1983
Chemical vapor deposition (CVD) is a widely used technique for the production of thin films of metals, semiconductors, and insulators [1]. In the standard procedure the chemical reaction is thermally activated near or on the hot surface of the substrate, where deposition takes place.
openaire   +1 more source

Simple Chemical Vapor Deposition Experiment

, 2014
Chemical vapor deposition (CVD) is a process commonly used for the synthesis of thin films for several important technological applications, for example, microelectronics, hard coatings, and smart windows.
Henrik Pedersen, Pedersen, Henrik,
core   +1 more source

The influence of deposition temperature on the structural, morphological and optical properties of micro-size structures of beta-Ga2O3

Results in Physics, 2019
Microstructures (MSs) of gallium oxide were synthetized via vapor-solid mechanism using the hydrogen-assisted chemical vapor deposition (HACVD) technique, without the aid of a carrier gas which is part of the usual CVD synthesis recipe.
Jubu Peverga Rex, Fong Kwong Yam, Hwee San Lim   +2 more
doaj   +1 more source

Pulsed PECVD for the growth of silicon nanowires

, 2006
Silicon nanowires of high density and high aspect ratio similar to those shown in the literature (Niu et al., 2004, Hofman et al., 2003) have been grown using a variation of plasma enhanced chemical vapour deposition (PECVD) known as pulsed plasma ...
Parlevliet, D., Cornish, J., David Parlevliet, John Cornish   +3 more
core   +1 more source

XPS investigations of MOCVD tin oxide thin layers on Si nanowires array

Results in Physics, 2018
Tin oxide thin layers were grown by metal-organic chemical vapor deposition technique on the top-down nanostructured silicon nanowires array obtained by metal-assisted wet-chemical technique from single crystalline silicon wafers.
S.Yu. Turishchev, O.A. Chuvenkova, E.V. Parinova, D.A. Koyuda, R.G. Chumakov, M. Presselt, A. Schleusener, V. Sivakov   +7 more
doaj   +1 more source

Highly selective chemical vapor deposition of tin diselenide thin films onto patterned substrates via single source diselenoether precursors

, 2012
The distorted octahedral complexes [SnCl4{nBuSe(CH2)nSenBu}]  (n = 2 or 3), (1) and (2), obtained from reaction of SnCl4 with the neutral bidentate ligands and characterized by IR/Raman and multinuclear (1H, 77Se{1H} and 119Sn) NMR spectroscopy and X-ray
Hector, Andrew L., de Groot CH, Jura M, de Groot, C.H., Gurnani, Chitra, Huang R, Levason W, Reid, Gillian, Reid G, Jura, Marek, Hector AL, Huang, Ruomeng, Levason, William, Gurnani C   +13 more
core   +1 more source

COMPARATIVE STUDY OF NANOCRYSTALLINE DIAMOND GROWTH USING PECVD AND HFCVD TECHNIQUES

Studia Universitatis Babes-Bolyai Chemia, 2016
Diamond coating is one of the hot research topic due to its various industrial applications; for the diamond growth, several techniques, such as PECVD and HFCVD, have been reported.
Zahra KHALAJ
doaj