Results 81 to 90 of about 104,686 (214)

Review: Plasma-enhanced chemical vapor deposition of nanocrystalline diamond

Science and Technology of Advanced Materials, 2007
Nanocrystalline diamond films have attracted considerable attention because they have a low coefficient of friction and a low electron emission threshold voltage. In this paper, the author reviews the plasma-enhanced chemical vapor deposition (PE-CVD) of
Katsuyuki Okada
doaj  

Time-resolved and Time-integrated Photoluminescence in ZnO Epilayers Grown by Metal-organic Vapor Phase Epitaxy

, 2001
1
이규철
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Organometallic Ruthenium Source Reagents for Chemical Vapor Deposition

, 2014
[[abstract]]The deposition of pure ruthenium thin films is reported from carbonyl β-diketonate precursors Ru(CO)2-(CH(C(O)R)2)2 (see Figure), where R = C(CH3)3 or CF3.
Lee, F.-J.;Chi, Y.;Hsu, P.-F.;Chou, T.-Y.;Liu, C.-S.;Peng, S.-M.;Lee, G.-H.
core   +1 more source

Direct Chemical-Vapor-Deposition-Fabricated, Large-Scale Graphene Glass with High Carrier Mobility and Uniformity for Touch Panel Applications

, 2016
In this work, we report the transfer-free measurement of carrier dynamics and transport of direct chemical vapor deposition (CVD) grown graphene on glass with the aid of ultrafast transient absorption microscopy (TAM) and demonstrate the use of such ...
Zhongfan Liu, Libai Huang, Zhaolong Chen, Mark H. Rümmeli (1300254), Jingyu Sun (1535020), Manish K. Priydarshi (3366989), Shuwei Liu (75090), Sun, Jingyu, Chen, Zhaolong, Donglin Ma, Zhongfan Liu (1270077), Chen, Yubin, Ma, Donglin, Libai Huang (1284738), Xiuju Song (1535023), Manish K. Priydarshi, Yanfeng Zhang (145335), Long Yuan (2617487), Jing Ning, Jing Ning (1481449), Donglin Ma (1611901), Tianbao Ma, Bachmatiuk, Alicja, Jingyu Sun, Yubin Chen, Yubin Chen (1428160), Yanfeng Zhang, Tianbao Ma (3366986), Ma, Tianbao, Shuwei Liu, Ning, Jing, Linjie Zhi, Zhaolong Chen (1535032), Zhi, Linjie, Alicja Bachmatiuk (1477825), Huang, Libai, Yuan, Long, Song, Xiuju, Psriydarshi, Manish K., Zhang, Yanfeng, Liu, Zhongfan, Rummeli, Mark H., Linjie Zhi (1661425), Xiuju Song, Mark H. Rümmeli, Alicja Bachmatiuk, Long Yuan, Liu, Shuwei   +47 more
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Production of carbon nanotubes by PECVD and their applications to supercapacitors

, 2010
Màster en Nanociència i NanotecnologiaPlasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD).
Caglar, Burak
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Unraveling Mass Transfer and Reaction Processes in CVD-Grown MoS₂ Films: A Multiphysical Field Coupling Study

Applied Sciences
The two-dimensional semiconductor material MoS2, grown via chemical vapor deposition, has shown significant potential to surpass silicon in advanced electronic technologies.
Zhen Yang, Jinwei Lin, Qing Zhang, Yutian Liu, Shujun Han, Yanbin Zhou, Shuo Chen, Shenlong Zhong, Xianli Su, Qingjie Zhang, Xinfeng Tang   +10 more
doaj   +1 more source

Control of morphology and luminescense of nanostructured ZnO layers for lasing applications

Moldavian Journal of the Physical Sciences, 2016
A comparative analysis of various technological methods for the preparation of nanostructured ZnO films is performed in this work to identify technologies suitable for the development of laser structures.
Burlacu, Alexandru
doaj  

Boundary layer chemical vapor synthesis of self-organized radial filled-carbon-nanotube structures

, 2013
We report a new chemical vapor synthesis method that exploits random fluctuations in the viscous boundary layer between a laminar vapor flow and a surface to yield a not previously observed product: radial ferromagnetically filled-carbon-nanotube ...
Baxendale, M., Mountjoy, G., Baxendale, M, Mountjoy, G, Boi, FS, Boi, F.S.   +5 more
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Plasma enhanced chemical vapor deposition of nanocrystalline graphene and device fabrication development [PDF]

, 2012
Large area growth of high quality graphene remains a challenge, and is currently dominated by chemical vapor deposition (CVD) on metal catalyst films.
Schmidt, Marek Edward, Schmidt, Marek E
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Low temperature hot-wire polysilicon waveguides

We fabricated and measured low loss polysilicon waveguides deposited using Hot-Wire Chemical Vapor Deposition (HWCVD) at 240 °C.
Tarazona, A., Chen, Xia, Chong, Harold M.H., Ben Masaud, Taha M., Reed, Graham T.   +4 more
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