Results 151 to 160 of about 36,341 (164)

Semi-empirical material removal rate distribution model for SiO2 chemical mechanical polishing (CMP) processes

Precision Engineering, 2013
H D Jeong, D A Dornfeld
exaly  

Design of experimental optimization for ULSI CMP process applications

Microelectronic Engineering, 2003
Yong-Jin Seo, Sang-Yong Kim
exaly  

Experimental dynamics characterization and monitoring of MRR in oxide chemical mechanical planarization (CMP) process

International Journal of Machine Tools and Manufacture, 2008
Prahalada Rao, Satish Bukkapatnam, R Komanduri   +2 more
exaly  

Electrocoagulation of chemical mechanical polishing (CMP) wastewater from semiconductor fabrication

Chemical Engineering Journal, 2003
Sheng H Lin
exaly  

Preparation of alumina/silica core-shell abrasives and their CMP behavior

Applied Surface Science, 2007
Hong Lei
exaly  

CMP pads

2005
openaire   +2 more sources

Copper CMP

2009
openaire   +1 more source

CMP Motif

2013
openaire   +1 more source

Removal of nanoparticles from CMP wastewater by magnetic seeding aggregation

Chemosphere, 2006
exaly  

CMP Technology

2004
openaire   +1 more source