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Preparation of nanocrystalline copper by electrodeposition

Journal of Materials Research, 1997
Copper particles of sizes in the range 3.1 to 11.4 nm have been grown within gel compositions of the system CuO–SiO2 by an electrodeposition process applying voltages varying from 5 to 15 V. Composite films of these metal particles dispersed in a polystyrene matrix have been prepared on Corning No. 7059 glass slides by a dip-coating technique and their
S. Bandyopadhyay, D. Chakravorty
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Anionic Impurities in Electrodeposited Copper

Transactions of the IMF, 1972
SummaryIn the electrodeposition of copper at the cathode, the anionic impurities codeposited with the metal are derived from the plating solution. The variation of these impurities has been studied as a function of current density, temperature, pH, and composition of the bath.
R. D. Srivastava, S. Kumar
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Electrodeposition of copper in the presence of cadmium

Electrochimica Acta, 1979
Abstract A study was made of the effect of cadmium concentration on the process of copper electrocrystallization from an ethylenediamine electrolyte on the (111) crystallographic plane of a copper single crystal. It was shown that a relation exists between superpolarization and depolarization of deposition of Cu-Cd alloy components, and cadmium ...
A. Budniok, J. Gala, I. Pluta
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The structure of electrodeposited copper—I

Electrochimica Acta, 1960
S.C. Barnes, G.G. Storey, H.J. Pick
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The Reflectivity of Copper Electrodeposits

Journal of The Electrochemical Society, 1952
W. H. Gauvin, C. A. Winklek
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COPPER ELECTRODEPOSITION IN MICROELECTRONICS

2022
PANECCASIO JR VINCENT   +3 more
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The Electrodeposition Of Copper-Lead Alloys.

1949
PhD ; Chemistry ; University of Michigan, Horace H. Rackham School of Graduate Studies ; http://deepblue.lib.umich.edu/bitstream/2027.42/183009/2/0002458 ...
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