Results 271 to 280 of about 360,598 (361)

Photocatalytic Water Splitting on the Lunar Surface: Prospects for In Situ Resource Utilization

open access: yesAdvanced Materials Interfaces, EarlyView.
Water has been found in craters on the moon nearby locations which are illuminated >80% of the time. Photocatalysis uses energy from sunlight to drive chemical reactions such as water splitting to produce oxygen and hydrogen. It is a scalable technology that requires lighter equipment and utilizes resources available on the moon. ABSTRACT The discovery
Ranjani Kalyan   +6 more
wiley   +1 more source

Characterization and Antimicrobial Activity of Hafnium Nanostructures Fabricated by Physical Vapor Deposition Through a Colloidal Mask

open access: yesAdvanced Materials Interfaces, EarlyView.
We generate hafnium nanostructures by first depositing polystyrene particles of varying diameter followed by physical vapour deposition of hafnium thin films. The resultant structure shows a kill‐on‐contact effect against both Gram‐negative Escherichia coli and Gram‐positive Staphylococcus aureus.
Andrew Boden   +6 more
wiley   +1 more source

Investigation of Structural, Mechanical and Electrochemical Properties of Temperature‐Dependent Dual AlN/TiAlN Coating Synthesized by CVD Process

open access: yesAdvanced Materials Interfaces, EarlyView.
This study investigates thermally CVD‐deposited AlN/TiAlN dual‐layer coatings over a Si substrate, focusing on the temperature‐dependent process‐structure relationship. Systematic characterization reveals that a dense AlN interlayer combined with an optimally deposited TiAlN top layer provides enhancement in mechanical strength, tribological stability,
Soham Das   +4 more
wiley   +1 more source

Plasma‐Sequence‐Engineered Atomic Layer Deposition of Ultra‐Thin SiNx for Enhanced Etching Resistance in Extreme Ultraviolet Pellicles

open access: yesAdvanced Materials Interfaces, EarlyView.
Plasma‐sequence‐engineered ALD (PSE‐ALD), based on sequential NH3 and N2 plasma pulses, enables ultrathin, dense SiNx films. ToF‐MS analysis confirms ligand removal via HCl evolution, while increased film density indicates network densification. The resulting SiNx coating provides robust protection of graphite under H2 plasma exposure.
Hye‐Young Kim   +7 more
wiley   +1 more source

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