Results 141 to 150 of about 217,256 (267)
Biodiversity and emerging infectious threats: the microbial dark matter of Southwest China. [PDF]
Guo N, Liu Z, Li Z, Xu J.
europepmc +1 more source
Digitalizing electroplating requires both domain knowledge and interoperability. This work introduces PlatOn, a domain ontology for trivalent chromium plating and coating characterization, and a hybrid pipeline that aligns it to a mid‐level reference ontology by combining eight similarity metrics with language model reasoning. Expert‐validated mappings
Janik Harter +10 more
wiley +1 more source
Hidden Targets in Cancer Immunotherapy: The Potential of "Dark Matter" Neoantigens. [PDF]
Rwandamuriye FX +3 more
europepmc +1 more source
The OntOMat ontology establishes a structured framework for polymer matrix fiber reinforced composite materials, integrating manufacturing processes, characterization methods, and multiscale design through the VDI/VDE 3682 formalized process description standard.
Nicolas Christ +19 more
wiley +1 more source
Analytical kernels for efficient constant Q transforms in dark matter searches with LIGO. [PDF]
Göttel AS, Raymond V.
europepmc +1 more source
During creep of a single‐crystal Ni‐based superalloy, the overall crystal orientation is observed to remain constant while the microstructure evolves. Despite the lack of macroscopic rotation, small (<1°) rotations are observed on the submicron size scale and are accommodated by counteracting rotations over the scale of several micrometers.
E. J. Payton +3 more
wiley +1 more source
Chasing the Ghost Proteome in the Dark Matter. [PDF]
Cardon T, Fournier I, Salzet M.
europepmc +1 more source
Multilayer Self‐Limiting Electrospray Deposition via Stepped Voltage Bias
Self‐limiting electrospray deposition (SLED) uses a high voltage to generate and deposit a charged payload on a target surface. The coating retains its charge, repelling newly arriving material. SLED thickness can be decreased by applying a secondary bias to the target.
Madhuri Deb +3 more
wiley +1 more source
Deep‐UV (258 nm) femtosecond pulses enable uniform amorphous silicon writing on Si(100)/(111) with a six‐fold larger fluence amorphization window than NIR methods. Optimized fluence and overlap yield 20–45 nm uniform and continuous amorphous layers. Microscopy shows sharp interfaces, and real‐time reflectivity reveals nanosecond melt–resolidification ...
Wissal Benali +5 more
wiley +1 more source

